The research and development activities concentrate on two main topics.
The activities in X-ray imaging follow the interest to improve X-ray imaging technologies for X-ray medical diagnostics as well as materials analysis. We are applying the high aspect ratio patterning technologies which are available at KIT through KNMF to develop and fabricate new X-ray optical components, like Compound Refractive X-ray Lenses (CRL) with focal spot size down to 100 nm for sample illumination and full filed X-ray microscopy at energies higher than 15 keV as well as X-ray prism lenses or multi focus lenses for beam shaping. We are targeting for application of those components at synchrotron beamlines at X-ray tubes and at X-FELs. X-ray gratings as the main components in grating based X-ray interferometry are developed and optimized in quality with the clear aim to bring this imaging technique to commercial application. Based on these gratings we are building new imaging set-ups for evaluating specific imaging applications together with our collaboration partners. By using the extraordinary possibilities of 3D micro patterning we are analyzing new optical concepts in the X-ray regime. In addition we are demonstrating the components performance and advantages in different applications. We also intend to combine X-ray imaging with other imaging technologies to receive correlated information.
The activities in lithography follow the aim to fabricate high aspect ratio 3-dimensinal structures using either X-ray lithography, laser lithography or 3D-laser patterning. These technologies can be accessed via KNMF. With our developments we are improving their performance and establish new process schemes. In deep X-ray lithography we are following new exposure strategies to minimize secondary effects to achieve higher structural quality. In 3D-laser writing we aim to fulfill application driven needs by increasing the writing volume and by establishing process modifications.