IMT-Wiki - User contributions [en]

Perkin Elmer Lambda 950

2017-04-24T15:19:28Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Device name:''' PerkinElmer - UV/VIS spektrometer

'''Model:''' LAMBDA 950

'''Device responsibles:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Room:''' R203

'''Wavelength range:''' 175 - 3300 nm

'''UV/Vis resolution:''' ≤ 0.05 nm

'''NIR resolution:''' ≤ 0.20 nm

'''Dimensions (W x D x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
The LAMBDA 950 is a spectrometer for measuring the reflection, absorption und transmission of diffrenct samples in a wavelength range from 170nm bis 3300nm.
A build-in InGaAs integrating sphere enables measurement of diffuse scattered light.

==Important rules==

a. When turning off the device wait for at least 10 minutes before turning it on again. Otherwise you will damage the lamps.

b. Always turn off the lamps if the device is not used for a while. If not used for a longer period, turn the device off completely! If someone has an appointment shortly after you – please coordinate.

==Getting started==

a. Turn on the device and turn on the computer; don’t start the software immediately.

b. Wait a few minutes before starting the software. Otherwise you might encounter problems during your measurement as the device could not properly set itself up.

c. A useful tool for setup is “manual control”. Here you can apply different settings for observing the changes in beam size, detector signal, make quick measurement at a single wavelength, etc.

Go to “Instruments”, click on “LAM950”, and select “Manual Control”.

d. Measurements are usually performed with “Scan”.

e. Always check the complete beam path. Are there obstacles? A lens? An iris? Is the reflection standard at the end installed?

==Scanning==

[[File:950 datacollection.JPG|720x600px]]

'''I'''
D2 lamped used for UV measurement from ~190 nm to ~320 nm. Wavelength as low as 175 nm are possible if purging the system with nitrogen. The tungsten lamp is used for measurements from 320 nm to 3300 nm. Default for the lamp change is 319.2 nm. Values between 300 nm and 350 nm can be used if plausible for your measurement. Higher or lower values can damage the system.

'''II'''
Two different monochromators are installed - intended for use with the different detectors. The switch in monochromator and detector should occur at the same wavelength (default: 860.8 nm). Values outside the range 700 nm to 900 nm can damage the system. Ideally the switch should occur where the sensitivity of the two detectors is nearly the same.

'''III'''
The slit width defines the spectral width of the used spectrum. Due to the difference in monochromators similar beam shapes are achieved if the InGaAs slit width is 4 times the PMT slit width (PMT 2 nm -> InGaAs 8 nm).
Servo control is available for InGaAs detection. The slit width will then vary to keep the detection rate constant. The lower the detector sensitivity (or lamp output) the larger the slit width. Control of the slit width is possible via the Gain.

'''IV'''
The gain is an electrical gain at the detector. Gain should be high enough for a signal to be detected and low enough not to cause saturation of the detector. Use “manual control” and the energy mode E1 and E2 to monitor the effect of different gains at different wavelengths. Saturation occurs for E1 or E2 > 100. The gain should be chosen such that the highest achieved value in the measurement range is ≈80 for E1 and E2

'''V'''
The response is the integration time at every wavelength. The higher the response the longer the measurement will take, but a higher signal to noise ratio is achieved. One chopper cycle is 0.04 s.

'''VI'''
The common beam mask (CBM) reduces the beam height, but also drastically reduces the beam intensity. For significant effects values below 50% are necessary. The change in beam size is most effective in the sample compartment and at the reflection port of the integration sphere. Almost no effect can be observed at other positions.

'''VII'''
Of the three components shown here only the attenuators are installed in our system. The beam is polarized (!) and the polarization cannot be controlled in the system directly. Here is a graph of the beam polarization.
1: totally “TE” polarized; 0: unpolarized light; -1: totally “TM” polarized.

[[File:950 pol.JPG|520x400px]]

==Operation Modes==

'''%T'''
Most straightforward mode of operation. The system first takes a reference spectrum (I0) and then your measurement spectrum (I). The output is I/I0 in percent.

'''%R'''
Output identical to %T. But the use of “corrections” is possible. Corrections are never necessary if your sample is positioned in front of the integrating sphere (measuring transmission). They might be important if your sample is positioned inside (measuring absorption) or at the back port of the sphere (measuring reflection).

Especially when measuring reflection slight offsets can occur. Examples:

1. The cover lid on the reflection port is black, but not a perfect absorber. Light will partially be reflected and travel back through your sample into the integrating sphere. This is important when measuring the reflection of highly transmitting samples. It will lead to a constant offset of ≈1%. Taking the 0% “blocked beam” baseline (not using the internal attenuators) without the reflection standard is necessary for high precision measurements.

2. If your sample is a great reflector it might be an even better reflector than the white spectralon (R ≈99% in the visible). In this case I > I0 you will therefore measure R > 100 %. You will need to active “Reflectance corrected for reference (%RC)” and select an appropriate “Light Spectral Reference”.

'''A'''
Same data as in %T is taken. But the output is A = - log10(I/I0).

'''E1 / E2'''
Energy output of the detector (Sample beam (E1) / reference beam (E2)). The values have no physical meaning. The data is a combination of the light intensity at a given wavelength, the detector sensitivity at that wavelength and the detector gain. No reference is applied to the data. Looking at these values can make sense for determining errors. Lower values mean little signal. A red exclamation mark means the detector is saturated.

==More useful information==

'''High absorbing samples'''

The system is equipped with a chopper for lock-in amplification. Additionally this chopper makes a continuous switching between the reference beam and the sample beam possible (Cycle time 0.04s), so they are never “on” at the same time. Problems occur if one of the beams is much stronger than the other. This is the case if a highly absorbing sample (A > 4) is placed in the sample beam.
To prevent unwanted effects the refrence beam needs to be attenuated using the internal attanuators. A 0% blocked beam reference (using the internal attenuators) should also be taken for high precision measurements (''corrections'').

'''Small area and inhomogenious samples'''

For small areas and inhomogenious samples precise measurements can only be taken if the beam shape is kept constant. This is especially important at the detector switch. Intensity should not be too low and the “multible of 4 rule” (see section C.III) should be maintained. Blends and lenes, available in a dawer underneath the PerkinElmer, can be used for reducing the beam size. Blends can be most easiliy be placed in the sample compartment. Lenses are only effecful is placed directly infront of the integrating sphere.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==
[[User:Stephan.Dottermusch|Stephan Dottermusch]]

[[User:Raphael.Schmager|Raphael Schmager]]

[[Category:Geräte - Devices]]

Perkin Elmer Lambda 950

2017-04-24T15:18:03Z

Stephan.Dottermusch:

Perkin Elmer Lambda 950

2017-04-24T15:11:22Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Device name:''' PerkinElmer - UV/VIS spektrometer

'''Model:''' LAMBDA 950

'''Device responsibles:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Room:''' R203

'''Wavelength range:''' 175 - 3300 nm

'''UV/Vis resolution:''' ≤ 0.05 nm

'''NIR resolution:''' ≤ 0.20 nm

'''Dimensions (W x D x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
The LAMBDA 950 is a spectrometer for measuring the reflection, absorption und transmission of diffrenct samples in a wavelength range from 170nm bis 3300nm.
A build-in InGaAs integrating sphere enables measurement of diffuse scattered light.

==Important rules==

a. When turning off the device wait for at least 10 minutes before turning it on again. Otherwise you will damage the lamps.

b. Always turn off the lamps if the device is not used for a while. If not used for a longer period, turn the device off completely! If someone has an appointment shortly after you – please coordinate.

==Getting started==

a. Turn on the device and turn on the computer; don’t start the software immediately.

b. Wait a few minutes before starting the software. Otherwise you might encounter problems during your measurement as the device could not properly set itself up.

c. A useful tool for setup is “manual control”. Here you can apply different settings for observing the changes in beam size, detector signal, make quick measurement at a single wavelength, etc.

Go to “Instruments”, click on “LAM950”, and select “Manual Control”.

d. Measurements are usually performed with “Scan”.

e. Always check the complete beam path. Are there obstacles? A lens? An iris? Is the reflection standard at the end installed?

==Scanning==

[[File:950 datacollection.JPG]]

'''I'''
D2 lamped used for UV measurement from ~190 nm to ~320 nm. Wavelength as low as 175 nm are possible if purging the system with nitrogen. The tungsten lamp is used for measurements from 320 nm to 3300 nm. Default for the lamp change is 319.2 nm. Values between 300 nm and 350 nm can be used if plausible for your measurement. Higher or lower values can damage the system.

'''II'''
Two different monochromators are installed - intended for use with the different detectors. The switch in monochromator and detector should occur at the same wavelength (default: 860.8 nm). Values outside the range 700 nm to 900 nm can damage the system. Ideally the switch should occur where the sensitivity of the two detectors is nearly the same.

'''III'''
The slit width defines the spectral width of the used spectrum. Due to the difference in monochromators similar beam shapes are achieved if the InGaAs slit width is 4 times the PMT slit width (PMT 2 nm -> InGaAs 8 nm).
Servo control is available for InGaAs detection. The slit width will then vary to keep the detection rate constant. The lower the detector sensitivity (or lamp output) the larger the slit width. Control of the slit width is possible via the Gain.

'''IV'''
The gain is an electrical gain at the detector. Gain should be high enough for a signal to be detected and low enough not to cause saturation of the detector. Use “manual control” and the energy mode E1 and E2 to monitor the effect of different gains at different wavelengths. Saturation occurs for E1 or E2 > 100. The gain should be chosen such that the highest achieved value in the measurement range is ≈80 for E1 and E2

'''V'''
The response is the integration time at every wavelength. The higher the response the longer the measurement will take, but a higher signal to noise ratio is achieved. One chopper cycle is 0.04 s.

'''VI'''
The common beam mask (CBM) reduces the beam height, but also drastically reduces the beam intensity. For significant effects values below 50% are necessary. The change in beam size is most effective in the sample compartment and at the reflection port of the integration sphere. Almost no effect can be observed at other positions.

'''VII'''
Of the three components shown here only the attenuators are installed in our system. The beam is polarized (!) and the polarization cannot be controlled in the system directly. Here is a graph of the beam polarization.
1: totally “TE” polarized; 0: unpolarized light; -1: totally “TM” polarized.

[[File:950 pol.JPG]]

==Operation Modes==

'''%T'''
Most straightforward mode of operation. The system first takes a reference spectrum (I0) and then your measurement spectrum (I). The output is I/I0 in percent.

'''%R'''
Output identical to %T. But the use of “corrections” is possible. Corrections are never necessary if your sample is positioned in front of the integrating sphere (measuring transmission). They might be important if your sample is positioned inside (measuring absorption) or at the back port of the sphere (measuring reflection).

Especially when measuring reflection slight offsets can occur. Examples:

1. The cover lid on the reflection port is black, but not a perfect absorber. Light will partially be reflected and travel back through your sample into the integrating sphere. This is important when measuring the reflection of highly transmitting samples. It will lead to a constant offset of ≈1%. Taking the 0% “blocked beam” baseline (not using the internal attenuators) without the reflection standard is necessary for high precision measurements.

2. If your sample is a great reflector it might be an even better reflector than the white spectralon (R ≈99% in the visible). In this case I > I0 you will therefore measure R > 100 %. You will need to active “Reflectance corrected for reference (%RC)” and select an appropriate “Light Spectral Reference”.

'''A'''
Same data as in %T is taken. But the output is A = - log10(I/I0).

'''E1 / E2'''
Energy output of the detector (Sample beam (E1) / reference beam (E2)). The values have no physical meaning. The data is a combination of the light intensity at a given wavelength, the detector sensitivity at that wavelength and the detector gain. No reference is applied to the data. Looking at these values can make sense for determining errors. Lower values mean little signal. A red exclamation mark means the detector is saturated.

==More useful information==

'''High absorbing samples'''

The system is equipped with a chopper for lock-in amplification. Additionally this chopper makes a continuous switching between the reference beam and the sample beam possible (Cycle time 0.04s), so they are never “on” at the same time. Problems occur if one of the beams is much stronger than the other. This is the case if a highly absorbing sample (A > 4) is placed in the sample beam.
To prevent unwanted effects the refrence beam needs to be attenuated using the internal attanuators. A 0% blocked beam reference (using the internal attenuators) should also be taken for high precision measurements (''corrections'').

'''Small area and inhomogenious samples'''

For small areas and inhomogenious samples precise measurements can only be taken if the beam shape is kept constant. This is especially important at the detector switch. Intensity should not be too low and the “multible of 4 rule” (see section C.III) should be maintained. Blends and lenes, available in a dawer underneath the PerkinElmer, can be used for reducing the beam size. Blends can be most easiliy be placed in the sample compartment. Lenses are only effecful is placed directly infront of the integrating sphere.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Category:Geräte - Devices]]

Perkin Elmer Lambda 950

2017-04-24T15:10:00Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Device name:''' PerkinElmer - UV/VIS spektrometer

'''Model:''' LAMBDA 950

'''Device responsibles:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Room:''' R203

'''Wavelength range:''' 175 - 3300 nm

'''UV/Vis resolution:''' ≤ 0.05 nm

'''NIR resolution:''' ≤ 0.20 nm

'''Dimensions (W x D x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
The LAMBDA 950 is a spectrometer for measuring the reflection, absorption und transmission of diffrenct samples in a wavelength range from 170nm bis 3300nm.
A build-in InGaAs integrating sphere enables measurement of diffuse scattered light.

==Important rules==

a. When turning off the device wait for at least 10 minutes before turning it on again. Otherwise you will damage the lamps.

b. Always turn off the lamps if the device is not used for a while. If not used for a longer period, turn the device off completely! If someone has an appointment shortly after you – please coordinate.

==Getting started==

a. Turn on the device and turn on the computer; don’t start the software immediately.

b. Wait a few minutes before starting the software. Otherwise you might encounter problems during your measurement as the device could not properly set itself up.

c. A useful tool for setup is “manual control”. Here you can apply different settings for observing the changes in beam size, detector signal, make quick measurement at a single wavelength, etc.

Go to “Instruments”, click on “LAM950”, and select “Manual Control”.

d. Measurements are usually performed with “Scan”.

e. Always check the complete beam path. Are there obstacles? A lens? An iris? Is the reflection standard at the end installed?

==Scanning==

[[File:950 datacollection.JPG]]

'''I'''
D2 lamped used for UV measurement from ~190 nm to ~320 nm. Wavelength as low as 175 nm are possible if purging the system with nitrogen. The tungsten lamp is used for measurements form 320 nm to 3300 nm. Default for the lamp change is 319.2 nm. Values between 300 nm and 350 nm can be used if plausible for your measurement. Higher or lower values can damage the system.

'''II'''
Two different monochromators are installed - intended for use with the different detectors. The switch in monochromator and detector should occur at the same wavelength (default: 860.8 nm). Values outside the range 700 nm to 900 nm can damage the system. Ideally the switch should occur where the sensitivity of the two detectors is nearly the same.

'''III'''
The slit width defines the spectral width of the used spectrum. Due to the difference in monochromators similar beam shapes are achieved if the InGaAs slit width is 4 times the PMT slit width (PMT 2 nm -> InGaAs 8 nm).
Servo control is available for InGaAs detection. The slit width will then vary to keep the detection rate constant. The lower the detector sensitivity (or lamp output) the larger the slit width. Control of the slit width is possible via the Gain.

'''IV'''
The gain is an electrical gain at the detector. Gain should be high enough for a signal to be detected and low enough not to cause saturation of the detector. Use “manual control” and the energy mode E1 and E2 to monitor the effect of different gains at different wavelengths. Saturation occurs for E1 or E2 > 100. The gain should be chosen such that the highest achieved value in the measurement range is ≈80 for E1 and E2

'''V'''
The response is the integration time at every wavelength. The higher the response the longer the measurement will take, but a higher signal to noise ratio is achieved. One chopper cycle is 0.04 s.

'''VI'''
The common beam mask (CBM) reduces the beam height, but also drastically reduces the beam intensity. For significant effects values below 50% are necessary. The change in beam size is most effective in the sample compartment and at the reflection port of the integration sphere. Almost no effect can be observed at other positions.

'''VII'''
Of the three components shown here only the attenuators are installed in our system. The beam is polarized (!) and the polarization cannot be controlled in the system directly. Here is a graph of the beam polarization.
1: totally “TE” polarized; 0: unpolarized light; -1: totally “TM” polarized.

[[File:950 pol.JPG]]

==Operation Modes==

'''%T'''
Most straightforward mode of operation. The system first takes a reference spectrum (I0) and then your measurement spectrum (I). The output is I/I0 in percent.

'''%R'''
Output identical to %T. But the use of “corrections” is possible. Corrections are never necessary if your sample is positioned in front of the integrating sphere (measuring transmission). They might be important if your sample is positioned inside (measuring absorption) or at the back port of the sphere (measuring reflection).

Especially when measuring reflection slight offsets can occur. Examples:

1. The cover lid on the reflection port is black, but not a perfect absorber. Light will partially be reflected and travel back through your sample into the integrating sphere. This is important when measuring the reflection of highly transmitting samples. It will lead to a constant offset of ≈1%. Taking the 0% “blocked beam” baseline (not using the internal attenuators) without the reflection standard is necessary for high precision measurements.

2. If your sample is a great reflector it might be an even better reflector than the white spectralon (R ≈99% in the visible). In this case I > I0 you will therefore measure R > 100 %. You will need to active “Reflectance corrected for reference (%RC)” and select an appropriate “Light Spectral Reference”.

'''A'''
Same data as in %T is taken. But the output is A = - log10(I/I0).

'''E1 / E2'''
Energy output of the detector (Sample beam (E1) / reference beam (E2)). The values have no physical meaning. The data is a combination of the light intensity at a given wavelength, the detector sensitivity at that wavelength and the detector gain. No reference is applied to the data. Looking at these values can make sense for determining errors. Lower values mean little signal. A red exclamation mark means the detector is saturated.

==More useful information==

'''High absorbing samples'''

The system is equipped with a chopper for lock-in amplification. Additionally this chopper makes a continuous switching between the reference beam and the sample beam possible (Cycle time 0.04s), so they are never “on” at the same time. Problems occur if one of the beams is much stronger than the other. This is the case if a highly absorbing sample (A > 4) is placed in the sample beam.
To prevent unwanted effects the refrence beam needs to be attenuated using the internal attanuators. A 0% blocked beam reference (using the internal attenuators) should also be taken for high precision measurements (''corrections'').

'''Small area and inhomogenious samples'''

For small areas and inhomogenious samples precise measurements can only be taken if the beam shape is kept constant. This is especially important at the detector switch. Intensity should not be too low and the “multible of 4 rule” (see section C.III) should be maintained. Blends and lenes, available in a dawer underneath the PerkinElmer, can be used for reducing the beam size. Blends can be most easiliy be placed in the sample compartment. Lenses are only effecful is placed directly infront of the integrating sphere.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Category:Geräte - Devices]]

Perkin Elmer Lambda 950

2017-04-24T15:08:37Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Device name:''' PerkinElmer - UV/VIS spektrometer

'''Model:''' LAMBDA 950

'''Device responsibles:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Room:''' R203

'''Wavelength range:''' 175 - 3300 nm

'''UV/Vis resolution:''' ≤ 0.05 nm

'''NIR resolution:''' ≤ 0.20 nm

'''Dimensions (W x D x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
The LAMBDA 950 is a spectrometer for measuring the reflection, absorption und transmission of diffrenct samples in a wavelength range from 170nm bis 3300nm.
A build-in InGaAs integrating sphere enables measurement of diffuse scattered light.

==Important rules==

a. When turning off the device wait for at least 10 minutes before turning it on again. Otherwise you will damage the lamps.

b. Always turn off the lamps if the device is not used for a while. If not used for a longer period, turn the device off completely! If someone has an appointment shortly after you – please coordinate.

==Getting started==

a. Turn on the device and turn on the computer; don’t start the software immediately.

b. Wait a few minutes before starting the software. Otherwise you might encounter problems during your measurement as the device could not properly set itself up.

c. A useful tool for setup is “manual control”. Here you can apply different settings for observing the changes in beam size, detector signal, make quick measurement as a single wavelength, etc.

Go to “Instruments”, click on “LAM950”, and select “Manual Control”.

d. Measurements are usually performed with “Scan”.

e. Always check the complete beam path. Are there obstacles? A lens? An iris? Is the reflection standard at the end installed?

==Scanning==

[[File:950 datacollection.JPG]]

'''I'''
D2 lamped used for UV measurement from ~190 nm to ~320 nm. Wavelength as low as 175 nm are possible if purging the system with nitrogen. The tungsten lamp is used for measurements form 320 nm to 3300 nm. Default for the lamp change is 319.2 nm. Values between 300 nm and 350 nm can be used if plausible for your measurement. Higher or lower values can damage the system.

'''II'''
Two different monochromators are installed - intended for use with the different detectors. The switch in monochromator and detector should occur at the same wavelength (default: 860.8 nm). Values outside the range 700 nm to 900 nm can damage the system. Ideally the switch should occur where the sensitivity of the two detectors is nearly the same.

'''III'''
The slit width defines the spectral width of the used spectrum. Due to the difference in monochromators similar beam shapes are achieved if the InGaAs slit width is 4 times the PMT slit width (PMT 2 nm -> InGaAs 8 nm).
Servo control is available for InGaAs detection. The slit width will then vary to keep the detection rate constant. The lower the detector sensitivity (or lamp output) the larger the slit width. Control of the slit width is possible via the Gain.

'''IV'''
The gain is an electrical gain at the detector. Gain should be high enough for a signal to be detected and low enough not to cause saturation of the detector. Use “manual control” and the energy mode E1 and E2 to monitor the effect of different gains at different wavelengths. Saturation occurs for E1 or E2 > 100. The gain should be chosen such that the highest achieved value in the measurement range is ≈80 for E1 and E2

'''V'''
The response is the integration time at every wavelength. The higher the response the longer the measurement will take, but a higher signal to noise ratio is achieved. One chopper cycle is 0.04 s.

'''VI'''
The common beam mask (CBM) reduces the beam height, but also drastically reduces the beam intensity. For significant effects values below 50% are necessary. The change in beam size is most effective in the sample compartment and at the reflection port of the integration sphere. Almost no effect can be observed at other positions.

'''VII'''
Of the three components shown here only the attenuators are installed in our system. The beam is polarized (!) and the polarization cannot be controlled in the system directly. Here is a graph of the beam polarization.
1: totally “TE” polarized; 0: unpolarized light; -1: totally “TM” polarized.

[[File:950 pol.JPG]]

==Operation Modes==

'''%T'''
Most straightforward mode of operation. The system first takes a reference spectrum (I0) and then your measurement spectrum (I). The output is I/I0 in percent.

'''%R'''
Output identical to %T. But the use of “corrections” is possible. Corrections are never necessary if your sample is positioned in front of the integrating sphere (measuring transmission). They might be important if your sample is positioned inside (measuring absorption) or at the back port of the sphere (measuring reflection).

Especially when measuring reflection slight offsets can occur. Examples:

1. The cover lid on the reflection port is black, but not a perfect absorber. Light will partially be reflected and travel back through your sample into the integrating sphere. This is important when measuring the reflection of highly transmitting samples. It will lead to a constant offset of ≈1%. Taking the 0% “blocked beam” baseline (not using the internal attenuators) without the reflection standard is necessary for high precision measurements.

2. If your sample is a great reflector it might be an even better reflector than the white spectralon (R ≈99% in the visible). In this case I > I0 you will therefore measure R > 100 %. You will need to active “Reflectance corrected for reference (%RC)” and select an appropriate “Light Spectral Reference”.

'''A'''
Same data as in %T is taken. But the output is A = - log10(I/I0).

'''E1 / E2'''
Energy output of the detector (Sample beam (E1) / reference beam (E2)). The values have no physical meaning. The data is a combination of the light intensity at a given wavelength, the detector sensitivity at that wavelength and the detector gain. No reference is applied to the data. Looking at these values can make sense for determining errors. Lower values mean little signal. A red exclamation mark means the detector is saturated.

==More useful information==

'''High absorbing samples'''

The system is equipped with a chopper for lock-in amplification. Additionally this chopper makes a continuous switching between the reference beam and the sample beam possible (Cycle time 0.04s), so they are never “on” at the same time. Problems occur if one of the beams is much stronger than the other. This is the case if a highly absorbing sample (A > 4) is placed in the sample beam.
To prevent unwanted effects the refrence beam needs to be attenuated using the internal attanuators. A 0% blocked beam reference (using the internal attenuators) should also be taken for high precision measurements (''corrections'').

'''Small area and inhomogenious samples'''

For small areas and inhomogenious samples precise measurements can only be taken if the beam shape is kept constant. This is especially important at the detector switch. Intensity should not be too low and the “multible of 4 rule” (see section C.III) should be maintained. Blends and lenes, available in a dawer underneath the PerkinElmer, can be used for reducing the beam size. Blends can be most easiliy be placed in the sample compartment. Lenses are only effecful is placed directly infront of the integrating sphere.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Category:Geräte - Devices]]

Perkin Elmer Lambda 950

2017-04-24T15:03:57Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Device name:''' PerkinElmer - UV/VIS spektrometer

'''Model:''' LAMBDA 950

'''Device responsibles:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Room:''' R203

'''Wavelength range:''' 175 - 3300 nm

'''UV/Vis resolution:''' ≤ 0.05 nm

'''NIR resolution:''' ≤ 0.20 nm

'''Dimensions (W x D x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
The LAMBDA 950 is a spectrometer for measuring the reflection, absorption und transmission of diffrenct samples in a wavelength range from 170nm bis 3300nm.
A build-in InGaAs integrating sphere enables measurement of diffuse scattered light.

==Important rules==

a. When turning off the device wait for at least 10 minutes before turning it on again. Otherwise you will damage the lamps.

b. Always turn off the lamps if the device is not used for a while. If not used for a longer period, turn the device off completely! If someone has an appointment shortly after you – please coordinate.

==Getting started==

a. Turn on the device and turn on the computer; don’t start the software immediately.

b. Wait a few minutes before starting the software. Otherwise you might encounter problems during your measurement as the device could not properly set itself up.

c. A useful tool for setup is “manual control”. Here you can apply different settings for observing the changes in beam size, detector signal, make quick measurement as a single wavelength, etc.

Go to “Instruments”, click on “LAM950”, and select “Manual Control”.

d. Measurements are usually performed with “Scan”.

e. Always check the complete beam path. Are there obstacles? A lens? An iris? Is the reflection standard at the end installed?

==Scanning==

[[File:950 datacollection.JPG]]

'''I'''
D2 lamped used for UV measurement from ~190 nm to ~320 nm. Wavelength as low as 175 nm are possible if purging the system with nitrogen. The tungsten lamp is used for measurements form 320 nm to 3300 nm. Default for the lamp change is 319.2 nm. Values between 300 nm and 350 nm can be used if plausible for your measurement. Higher or lower values can damage the system.

'''II'''
Two different monochromators are installed - intended for use with the different detectors. The switch in monochromator and detector should occur at the same wavelength (default: 860.8 nm). Values outside the range 700 nm to 900 nm can damage the system. Ideally the switch should occur where the sensitivity of the two detectors is nearly the same.

'''III'''
The slit width defines the spectral width of the used spectrum. Due to the difference in monochromators similar beam shapes are achieved if the InGaAs slit width is 4 times the PMT slit width (PMT 2 nm -> InGaAs 8 nm).
Servo control is available for InGaAs detection. The slit width will then vary to keep the detection rate constant. The lower the detector sensitivity (or lamp output) the larger the slit width. Control of the slit width is possible via the Gain.

'''IV'''
The gain is an electrical gain at the detector. Gain should be high enough for a signal to be detected and low enough not to cause saturation of the detector. Use “manual control” and the energy mode E1 and E2 to monitor the effect of different gains at different wavelengths. Saturation occurs for E1 or E2 > 100. The gain should be chosen such that the highest achieved value in the measurement range is ≈80 for E1 and E2

'''V'''
The response is the integration time at every wavelength. The higher the response the longer the measurement will take, but a higher signal to noise ratio is achieved. One chopper cycle is 0.04 s.

'''VI'''
The common beam mask (CBM) reduces the beam height, but also drastically reduces the beam intensity. For significant effects values below 50% are necessary. The change in beam size is most effective in the sample compartment and at the reflection port of the integration sphere. Almost no effect can be observed at other positions.

'''VII'''
Of the three components shown here only the attenuators are installed in our system. The beam is polarized (!) and the polarization cannot be controlled in the system directly. Here is a graph of the beam polarization.
1: totally “TE” polarized; 0: unpolarized light; -1: totally “TM” polarized.

[[File:950 pol.JPG]]

==Operation Modes==

'''%T'''
Most straightforward mode of operation. The system first takes a reference spectrum (I0) and then your measurement spectrum (I). The output is I/I0 in percent.

'''%R'''
Output identical to %T. But the use of “corrections” is possible. Corrections are never necessary if your sample is positioned in front of the integrating sphere (measuring transmission). They might be important if your sample is positioned inside (measuring absorption) or at the back port of the sphere (measuring reflection).

Especially when measuring reflection slight offsets can occur. Examples:

1. The cover lid on the reflection port is black, but not a perfect absorber. Light will partially be reflected and travel back through your sample into the integrating sphere. This is important when measuring the reflection of highly transmitting samples. It will lead to a constant offset of ≈1%. Taking the 0% “blocked beam” baseline (not using the internal attenuators) without the reflection standard is necessary for high precision measurements.

2. If your sample is a great reflector it might be an even better reflector than the white spectralon (R ≈99% in the visible). In this case I > I0 you will therefore measure R > 100 %. You will need to active “Reflectance corrected for reference (%RC)” and select an appropriate “Light Spectral Reference”.

'''A'''
Same data as in %T is taken. But the output is A = - log10(I/I0).

'''E1 / E2'''
Energy output of the detector (Sample beam (E1) / reference beam (E2)). The values have no physical meaning. The data is a combination of the light intensity at a given wavelength, the detector sensitivity at that wavelength and the detector gain. No reference is applied to the data. Looking at these values can make sense for determining errors. Lower values mean little signal. A red exclamation mark means the detector is saturated.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Category:Geräte - Devices]]

Perkin Elmer Lambda 950

2017-04-24T13:00:28Z

Stephan.Dottermusch:

File:950 pol.JPG

2017-04-24T12:59:58Z

Stephan.Dottermusch:

File:950 datacollection.JPG

2017-04-24T12:56:55Z

Stephan.Dottermusch: Stephan.Dottermusch uploaded a new version of "File:950 datacollection.JPG"

Data collection tab of Lambda 950

File:950 datacollection.JPG

2017-04-24T12:54:24Z

Stephan.Dottermusch: Stephan.Dottermusch uploaded a new version of "File:950 datacollection.JPG"

Data collection tab of Lambda 950

Perkin Elmer Lambda 950

2017-04-24T12:51:13Z

Stephan.Dottermusch:

File:950 datacollection.JPG

2017-04-24T12:50:53Z

Stephan.Dottermusch: Data collection tab of Lambda 950

Data collection tab of Lambda 950

Perkin Elmer Lambda 950

2017-04-24T12:46:48Z

Stephan.Dottermusch:

Perkin Elmer Lambda 950

2017-04-24T12:34:08Z

Stephan.Dottermusch:

[[file:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Gerätebezeichnung:''' PerkinElmer - UV/VIS-Spektrometer

'''Modell:''' LAMBDA 950

'''Geräteverantwortliche/Operateure:''' [[User:Stephan.Dottermusch|Stephan Dottermusch]], [[User:Raphael.Schmager|Raphael Schmager]]

'''Standort:''' R203

'''Betriebsbereich:''' 175 - 3300 nm

'''UV/Vis Auflösung:''' ≤ 0.05 nm

'''NIR Auflösung:''' ≤ 0.20 nm

'''Abmessung (W x B x H):''' 1020 mm x 630 mm x 300 mm

== Short description ==
Das LAMBDA 950 ist ein Spektrometer mit dem Reflexion, Absorbtion und Transmission von Proben im Wellenlängenbreich von 170nm bis 3300nm gemessen werden können. Laut Hersteller eignet es sich für: "hochpräzise Messungen und für Anwendungen wie hochreflektierende und Antireflexionsbeschichtungen, Farbkorrektur Beschichtungen, Bandpasseigenschaften von UV, VIS und NIR Filter , und mehr".

Für die Messung ist zusätzlich eine Ulbricht-Kugel (InGaAs Sphere mit 150mm Durchmesser) eingebaut.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Category:Geräte - Devices]]

EQE Measurement system

2016-10-28T11:09:44Z

Stephan.Dottermusch: Änderung 4963 von Stephan.Dottermusch (Diskussion) rückgängig gemacht.

EQE Measurement system

2016-10-28T11:09:20Z

Stephan.Dottermusch: Änderung 4964 von Stephan.Dottermusch (Diskussion) rückgängig gemacht.

EQE Measurement system

2016-10-28T11:08:40Z

Stephan.Dottermusch: Änderung 4966 von Stephan.Dottermusch (Diskussion) rückgängig gemacht.

EQE Measurement system

2016-10-28T11:08:25Z

Stephan.Dottermusch: Änderung 4964 von Stephan.Dottermusch (Diskussion) rückgängig gemacht.

Prism Coupler - Metricon

2016-10-28T11:08:16Z

Stephan.Dottermusch: Die Seite wurde neu angelegt: „ English Version <!-- Falls Bilder angezeigt werden sollen, müssen die entsprechenden Dateien erst hochgeladen werden. Dies ermö…“

EQE Measurement system

2016-10-28T11:06:38Z

Stephan.Dottermusch:

EQE Measurement system

2016-10-28T11:06:26Z

Stephan.Dottermusch:

Perkin Elmer Lambda 950

2016-10-28T10:43:27Z

Stephan.Dottermusch:

[[Datei:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Gerätebezeichnung:''' PerkinElmer - UV/VIS-Spektrometer

'''Modell:''' LAMBDA 950

'''Geräteverantwortliche/Operateure:''' [[Benutzer:Stephan.Dottermusch|Stephan Dottermusch]], [[Benutzer:Raphael.Schmager|Raphael Schmager]]

'''Standort:''' R203

'''Betriebsbereich:''' 175 - 3300 nm

'''UV/Vis Auflösung:''' ≤ 0.05 nm

'''NIR Auflösung:''' ≤ 0.20 nm

'''Abmessung (W x B x H):''' 1020 mm x 630 mm x 300 mm

== Kurzbeschreibung ==
Das LAMBDA 950 ist ein Spektrometer mit dem Reflexion, Absorbtion und Transmission von Proben im Wellenlängenbreich von 170nm bis 3300nm gemessen werden können. Laut Hersteller eignet es sich für: "hochpräzise Messungen und für Anwendungen wie hochreflektierende und Antireflexionsbeschichtungen, Farbkorrektur Beschichtungen, Bandpasseigenschaften von UV, VIS und NIR Filter , und mehr".

Für die Messung ist zusätzlich eine Ulbricht-Kugel (InGaAs Sphere mit 150mm Durchmesser) eingebaut.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Kategorie:Geräte - Devices]]

Perkin Elmer Lambda 950

2016-10-28T10:42:21Z

Stephan.Dottermusch: /* Kurzbeschreibung */

[[Datei:perkinelmer.jpg|250px|thumb|right|PerkinElmer]]

'''Gerätebezeichnung:''' PerkinElmer

'''Modell:''' LAMBDA 950

'''Geräteverantwortliche/Operateure:''' [[Benutzer:Stephan.Dottermusch|Stephan Dottermusch]], [[Benutzer:Raphael.Schmager|Raphael Schmager]]

'''Standort:''' R203

'''Betriebsbereich:''' 175 - 3300 nm

'''UV/Vis Auflösung:''' ≤ 0.05 nm

'''NIR Auflösung:''' ≤ 0.20 nm

'''Abmessung (W x B x H):''' 1020 mm x 630 mm x 300 mm

== Kurzbeschreibung ==
Das LAMBDA 950 ist ein Spektrometer mit dem Reflexion, Absorbtion und Transmission von Proben im Wellenlängenbreich von 170nm bis 3300nm gemessen werden können. Laut Hersteller eignet es sich für: "hochpräzise Messungen und für Anwendungen wie hochreflektierende und Antireflexionsbeschichtungen, Farbkorrektur Beschichtungen, Bandpasseigenschaften von UV, VIS und NIR Filter , und mehr".

Für die Messung ist zusätzlich eine Ulbricht-Kugel (InGaAs Sphere mit 150mm Durchmesser) eingebaut.

== Technische Doku ==
[https://shop.perkinelmer.com/Content/RelatedMaterials/SpecificationSheets/SPC_LAMBDA950850.pdf Technische Doku]

== Eingewiesene Nutzer ==

[[Kategorie:Geräte - Devices]]

User:Stephan.Dottermusch

2016-10-28T10:40:38Z

Stephan.Dottermusch: /* Geräte */

[[Datei:Dottermusch.jpg|thumb|400x200px|rechts|Stephan Dottermusch]]

[[Benutzer:{{PAGENAME}}/English|English Version]]

== Stephan Dottermusch ==


'''Funktionsbereich''': [[F&E4]]

'''Aufgabengebiet''': Nanostructured Solar Cells

'''Bau''': 307

'''Raum''': 224

'''Telefon''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Tätigkeitsbeschreibung ==
Doktorand im Bereich Nanophotonics for Energy. 3D Strukturierung des aktiven Bereichs einer Solarzelle.

== Fertigkeiten/Kenntnisse ==

=== Geräte ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[Perkin Elmer]]
*[[EQE Measurement system]]

=== Prozesse ===

=== Software ===

*Microsoft Office
*Matlab
*[[Lumerical]]

=== Materialien ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] für IMT-Projekte ==
* [[14-189]]

==Belohnungen für Wiki-Engagement==
[[Datei:Giraffemitstern.png|thumb|200x265px|rechts|Giraffe mit Sternchen für Wiki-Engagement im Februar 2015 ]]

Stephan bekommt für sein Engagement im Wiki-Artikel schreiben für den Monat Februar 2015 eine Giraffe mit *.

Verliehen von den Wiki-Verantwortlichen. Unterschrift: [[Benutzer:Marcel.Gueltig|Marcel.Gueltig]] ([[Benutzer Diskussion:Marcel.Gueltig|Diskussion]]) 15:47, 3. Mär. 2015 (CET)

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

Trockenofen Memmert 400

2015-02-02T13:03:33Z

Stephan.Dottermusch:

Trockenofen Memmert 400

2015-02-02T13:03:17Z

Stephan.Dottermusch:

Trockenofen Memmert 400

2015-02-02T12:59:37Z

Stephan.Dottermusch: Die Seite wurde neu angelegt: „{{ers:Geräte-Devices}}“

[[{{PAGENAME}}/English | English Version]]


[[Datei:platzhalter.jpg|250px|thumb|right|<Bildunterschrift>]]

'''Gerätebezeichnung:''' XXXXXXXX

'''Geräteverantwortliche/Operateure:''' XXXX

'''Standort:''' XXXX

'''Prüfmittel-/Fertigungsmittelnummer:''' XXXX

'''Spezifikations-Nummer:''' SP-XXXX

== Kurzbeschreibung ==

== Alternativen ==
Gibt es andere Geräte, die gleiche oder ähnliche Funktion haben/Prozesse durchführen können? Bitte hier benennen und verlinken. Den korrekten Namen der Wiki-Seite des zu verlinkenden Geräts findet sich in der [[Prüfmittel_Liste_-_List_of_Measurement_Devices| Prüfmittel Liste]] oder der [[Liste der Fertigungsmittel - List of Manufacturing Equipment|Liste der Fertigungsmittel]].

== Spezifikationen des Geräts ==
(Zusätzliche) Ausstattung und Funktionen, z.B. Prozessgase, Wellenlängen, Auflösung, Strukturdimensionen

== Etablierte Prozesse ==
Welche Prozesse wurden erfolgreich mit diesem Gerät durchgeführt, welche Materialien wurden mit dem Gerät strukturiert, geprüft, verarbeitet? Bitte keine Prozessparameter und sensible Details in die Wiki eintragen, stattdessen Hinweise, wo man diese finden oder erfragen kann (z.B. Pfad zu Dokument im J: Laufwerk).

== Einschränkungen ==
Welche Prozesse lassen sich mit dem Gerät nicht durchführen oder würden die Funktion des Gerätes beeinträchtigen?

== Eingewiesene Nutzer ==
Personen bitte immer mit [[Benutzer:Vorname.Nachname | Nachname, Vorname]] verknüpfen.

[[Kategorie:Geräte - Devices]]

Solar Simulator

2015-02-02T12:54:40Z

Stephan.Dottermusch:

Solar Simulator

2015-02-02T12:54:19Z

Stephan.Dottermusch:

Solar Simulator

2015-02-02T12:49:12Z

Stephan.Dottermusch: Die Seite wurde neu angelegt: „{{ers:Geräte-Devices}}“

User:Stephan.Dottermusch/English

2015-02-02T12:10:56Z

Stephan.Dottermusch:

[[Datei:Dottermusch.jpg|thumb|400x200px|rechts|Stephan Dottermusch]]

[[Benutzer:Stephan.Dottermusch|Deutsche Seite]]

== Stephan Dottermusch ==


'''Department''': [[F&E4]]

'''Research Field''': Nanostructured Solar Cells

'''Building''': 307

'''Room''': 224

'''Telephone''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Job Description ==
PhD student in the field of Nanophotonics for Energy. 3D structuring of the active region of a solar cell.

== Expertise ==

=== Devices ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[EQE Measurement system]]

=== Processes ===

=== Software ===

*Microsoft Office
*Matlab
*Lumerical

=== Materials ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] for IMT Projects ==
* [[14-189]]

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

User:Stephan.Dottermusch

2015-02-02T12:10:37Z

Stephan.Dottermusch:

[[Datei:Dottermusch.jpg|thumb|400x200px|rechts|Stephan Dottermusch]]

[[Benutzer:{{PAGENAME}}/English|English Version]]

== Stephan Dottermusch ==


'''Funktionsbereich''': [[F&E4]]

'''Aufgabengebiet''': Nanostructured Solar Cells

'''Bau''': 307

'''Raum''': 224

'''Telefon''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Tätigkeitsbeschreibung ==
Doktorand im Bereich Nanophotonics for Energy. 3D Strukturierung des aktiven Bereichs einer Solarzelle.

== Fertigkeiten/Kenntnisse ==

=== Geräte ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[EQE Measurement system]]

=== Prozesse ===

=== Software ===

*Microsoft Office
*Matlab
*[[Lumerical]]

=== Materialien ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] für IMT-Projekte ==
* [[14-189]]

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

Karlsruhe School of Optics & Photonics (KSOP)/English

2015-02-02T10:48:29Z

Stephan.Dottermusch:

The [http://ksop.idschools.kit.edu/ Karlsruhe School of Optics & Photonics (KSOP)] is a graduate school of the KIT. It offers a M.Sc. program and a graduate program for PhD students in this field.

== PhD program ==
'''Contact Person:''' [http://ksop.idschools.kit.edu/school_members_2912.php Stefanie Peer]

== M.Sc. program ==
'''Contact Person:''' [http://ksop.idschools.kit.edu/school_members_sonnenbichler_miriam.php Miriam Sonnenbichler]

== IMT PhD students in KSOP ==
*[[Benutzer:Uwe.Bog | Bog, Uwe]]
*[[Benutzer:Frieder.Koch | Koch, Frieder]]
*[[Benutzer:Xin.Liu | Liu, Xin]]
*[[Benutzer:Felix.Marschall | Marschall, Felix]]
*[[Benutzer:Jan.Meiser | Meiser, Jan]]
*[[Benutzer:Duc.Nguyen | Nguyen, Duc]]
*[[Benutzer:Heinrich.Sieber | Sieber, Heinrich]]
*[[Benutzer:Harald.Vogt | Vogt, Harald]]
*[[Benuter:Tobias.Wienhold | Wienhold, Tobias]]
*[[Benutzer:Stephan.Dottermusch | Dottermusch, Stephan]]
*[[Benutzer:Ella.Mareis | Mareis, Ella]]
*[[Benutzer:Michael.Oldenburg | Oldenburg, Micheal]]
*[[Benutzer:Nicolo.Baroni | Baroni, Nicolo]]

== Links ==
*[http://ksop.idschools.kit.edu/index.php Karlsruhe School of Optics & Photonics]
*[http://ksop.idschools.kit.edu/phd_projects.php List of current KSOP PhD students]

[[Kategorie:English]]

Karlsruhe School of Optics & Photonics (KSOP)/English

2015-02-02T10:48:06Z

Stephan.Dottermusch:

The [http://ksop.idschools.kit.edu/ Karlsruhe School of Optics & Photonics (KSOP)] is a graduate school of the KIT. It offers a M.Sc. program and a graduate program for PhD students in this field.

== PhD program ==
'''Contact Person:''' [http://ksop.idschools.kit.edu/school_members_angelova_denica.php Denica Angelova]

== M.Sc. program ==
'''Contact Person:''' [http://ksop.idschools.kit.edu/school_members_sonnenbichler_miriam.php Miriam Sonnenbichler]

== IMT PhD students in KSOP ==
*[[Benutzer:Uwe.Bog | Bog, Uwe]]
*[[Benutzer:Frieder.Koch | Koch, Frieder]]
*[[Benutzer:Xin.Liu | Liu, Xin]]
*[[Benutzer:Felix.Marschall | Marschall, Felix]]
*[[Benutzer:Jan.Meiser | Meiser, Jan]]
*[[Benutzer:Duc.Nguyen | Nguyen, Duc]]
*[[Benutzer:Heinrich.Sieber | Sieber, Heinrich]]
*[[Benutzer:Harald.Vogt | Vogt, Harald]]
*[[Benuter:Tobias.Wienhold | Wienhold, Tobias]]
*[[Benutzer:Stephan.Dottermusch | Dottermusch, Stephan]]
*[[Benutzer:Ella.Mareis | Mareis, Ella]]
*[[Benutzer:Michael.Oldenburg | Oldenburg, Micheal]]
*[[Benutzer:Nicolo.Baroni | Baroni, Nicolo]]

== Links ==
*[http://ksop.idschools.kit.edu/index.php Karlsruhe School of Optics & Photonics]
*[http://ksop.idschools.kit.edu/phd_projects.php List of current KSOP PhD students]

[[Kategorie:English]]

Karlsruhe School of Optics & Photonics (KSOP)

2015-02-02T10:47:30Z

Stephan.Dottermusch:

[[Karlsruhe School of Optics & Photonics (KSOP)/English|English Version]]

Die [http://ksop.idschools.kit.edu/ Karlsruhe School of Optics & Photonics (KSOP)] ist eine Graduiertenschule des KIT. Sie bietet einen Masterstudiengang und ein Graduiertenprogramm für Doktoranden aus diesem Bereich an.

== Doktorandenprogramm ==
'''Ansprechpartnerin:''' [http://ksop.idschools.kit.edu/school_members_2912.php Stefanie Peer]

== Masterstudiengang ==
'''Ansprechpartnerin:''' [http://ksop.idschools.kit.edu/school_members_sonnenbichler_miriam.php Miriam Sonnenbichler]

== IMT-Doktoranden in der KSOP ==
*[[Benutzer:Uwe.Bog | Bog, Uwe]]
*[[Benutzer:Frieder.Koch | Koch, Frieder]]
*[[Benutzer:Xin.Liu | Liu, Xin]]
*[[Benutzer:Felix.Marschall | Marschall, Felix]]
*[[Benutzer:Jan.Meiser | Meiser, Jan]]
*[[Benutzer:Duc.Nguyen | Nguyen, Duc]]
*[[Benutzer:Heinrich.Sieber | Sieber, Heinrich]]
*[[Benutzer:Harald.Vogt | Vogt, Harald]]
*[[Benuter:Tobias.Wienhold | Wienhold, Tobias]]
*[[Benutzer:Radwanul.Siddique | Siddique, Radwanul Hasan]]
*[[Benutzer:Stephan.Dottermusch | Dottermusch, Stephan]]
*[[Benutzer:Ella.Mareis | Mareis, Ella]]
*[[Benutzer:Michael.Oldenburg | Oldenburg, Micheal]]
*[[Benutzer:Nicolo.Baroni | Baroni, Nicolo]]

== Links ==
*[http://ksop.idschools.kit.edu/index.php Karlsruhe School of Optics & Photonics]
*[http://ksop.idschools.kit.edu/phd_projects.php Liste der aktuellen KSOP-Doktoranden]

[[Category:Organisationen - Organisations]]
[[Category:KSOP]]

User:Stephan.Dottermusch

2015-02-02T10:45:19Z

Stephan.Dottermusch:

[[Datei:Platzhalter.jpg|thumb|500x250px|rechts|Stephan Dottermusch]]

[[Benutzer:{{PAGENAME}}/English|English Version]]

== Stephan Dottermusch ==


'''Funktionsbereich''': [[F&E4]]

'''Aufgabengebiet''': Nanostructured Solar Cells

'''Bau''': 307

'''Raum''': 224

'''Telefon''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Tätigkeitsbeschreibung ==
Doktorand im Bereich Nanophotonics for Energy. 3D Strukturierung des aktiven Bereichs einer Solarzelle.

== Fertigkeiten/Kenntnisse ==

=== Geräte ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[EQE Measurement system]]

=== Prozesse ===

=== Software ===

*Microsoft Office
*Matlab
*[[Lumerical]]

=== Materialien ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] für IMT-Projekte ==
* [[14-189]]

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

Karlsruhe School of Optics & Photonics (KSOP)

2015-02-02T10:44:10Z

Stephan.Dottermusch:

[[Karlsruhe School of Optics & Photonics (KSOP)/English|English Version]]

Die [http://ksop.idschools.kit.edu/ Karlsruhe School of Optics & Photonics (KSOP)] ist eine Graduiertenschule des KIT. Sie bietet einen Masterstudiengang und ein Graduiertenprogramm für Doktoranden aus diesem Bereich an.

== Doktorandenprogramm ==
'''Ansprechpartnerin:''' [http://ksop.idschools.kit.edu/school_members_angelova_denica.php Denica Angelova]

== Masterstudiengang ==
'''Ansprechpartnerin:''' [http://ksop.idschools.kit.edu/school_members_sonnenbichler_miriam.php Miriam Sonnenbichler]

== IMT-Doktoranden in der KSOP ==
*[[Benutzer:Uwe.Bog | Bog, Uwe]]
*[[Benutzer:Frieder.Koch | Koch, Frieder]]
*[[Benutzer:Xin.Liu | Liu, Xin]]
*[[Benutzer:Felix.Marschall | Marschall, Felix]]
*[[Benutzer:Jan.Meiser | Meiser, Jan]]
*[[Benutzer:Duc.Nguyen | Nguyen, Duc]]
*[[Benutzer:Heinrich.Sieber | Sieber, Heinrich]]
*[[Benutzer:Harald.Vogt | Vogt, Harald]]
*[[Benuter:Tobias.Wienhold | Wienhold, Tobias]]
*[[Benutzer:Radwanul.Siddique | Siddique, Radwanul Hasan]]
*[[Benutzer:Stephan.Dottermusch | Dottermusch, Stephan]]
*[[Benutzer:Ella.Mareis | Mareis, Ella]]
*[[Benutzer:Michael.Oldenburg | Oldenburg, Micheal]]
*[[Benutzer:Nicolo.Baroni | Baroni, Nicolo]]

== Links ==
*[http://ksop.idschools.kit.edu/index.php Karlsruhe School of Optics & Photonics]
*[http://ksop.idschools.kit.edu/phd_projects.php Liste der aktuellen KSOP-Doktoranden]

[[Category:Organisationen - Organisations]]
[[Category:KSOP]]

User:Stephan.Dottermusch

2015-02-02T10:36:34Z

Stephan.Dottermusch:

[[Datei:Dottermusch.jpg|thumb|500x250px|rechts|Stephan Dottermusch]]

[[Benutzer:{{PAGENAME}}/English|English Version]]

== Stephan Dottermusch ==


'''Funktionsbereich''': [[F&E4]]

'''Aufgabengebiet''': Nanostructured Solar Cells

'''Bau''': 307

'''Raum''': 224

'''Telefon''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Tätigkeitsbeschreibung ==
Doktorand im Bereich Nanophotonics for Energy. 3D Strukturierung des aktiven Bereichs einer Solarzelle.

== Fertigkeiten/Kenntnisse ==

=== Geräte ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[EQE Measurement system]]

=== Prozesse ===

=== Software ===

*Microsoft Office
*Matlab
*[[Lumerical]]

=== Materialien ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] für IMT-Projekte ==
* [[14-189]]

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

File:Dottermusch.jpg

2015-02-02T10:36:14Z

Stephan.Dottermusch: Stephan Dottermusch

Stephan Dottermusch

User:Stephan.Dottermusch/English

2015-01-26T15:44:05Z

Stephan.Dottermusch:

[[Datei:Platzhalter.jpg|thumb|500x250px|rechts|Stephan Dottermusch]]

[[Benutzer:Stephan.Dottermusch|Deutsche Seite]]

== Stephan Dottermusch ==


'''Department''': [[F&E4]]

'''Research Field''': Nanostructured Solar Cells

'''Building''': 307

'''Room''': 224

'''Telephone''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Job Description ==
PhD student in the field of Nanophotonics for Energy. 3D structuring of the active region of a solar cell.

== Expertise ==

=== Devices ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]
*[[EQE Measurement system]]

=== Processes ===

=== Software ===

*Microsoft Office
*Matlab
*Lumerical

=== Materials ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] for IMT Projects ==
* [[14-189]]

[[Kategorie:Mitarbeiter - Employees]]
[[Kategorie:F&E4]]
[[Kategorie:Doktoranden - PhD Students]]

User:Stephan.Dottermusch

2015-01-26T15:43:55Z

Stephan.Dottermusch:

User:Stephan.Dottermusch

2015-01-26T15:33:12Z

Stephan.Dottermusch:

EQE Measurement system

2015-01-26T15:23:44Z

Stephan.Dottermusch:

EQE Measurement system

2015-01-26T15:17:49Z

Stephan.Dottermusch:

EQE Measurement system

2015-01-26T15:17:08Z

Stephan.Dottermusch: Die Seite wurde neu angelegt: „==EQE==“

==EQE==

User:Stephan.Dottermusch/English

2015-01-26T15:16:26Z

Stephan.Dottermusch:

User:Stephan.Dottermusch/English

2015-01-26T15:10:27Z

Stephan.Dottermusch:

[[Datei:Platzhalter.jpg|thumb|500x250px|rechts|Stephan Dottermusch]]

[[Benutzer:Stephan.Dottermusch|Deutsche Seite]]

== Stephan Dottermusch ==


'''Department''': [[F&E4]]

'''Research Field''': Nanostructured Solar Cells

'''Building''': 307

'''Room''': 224

'''Telephone''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Job Description ==
PhD student in the field of Nanophotonics for Energy. 3D structuring of the active region of a solar cell.

== Expertise ==

=== Devices ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]

=== Processes ===

=== Software ===

*Microsoft Office
*Matlab
*Lumerical

=== Materials ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] for IMT Projects ==
* [[14-189]]

User:Stephan.Dottermusch

2015-01-26T15:10:14Z

Stephan.Dottermusch:

[[Datei:Platzhalter.jpg|thumb|500x250px|rechts|Stephan Dottermusch]]

[[Benutzer:{{PAGENAME}}/English|English Version]]

== Stephan Dottermusch ==


'''Funktionsbereich''': [[F&E4]]

'''Aufgabengebiet''': Nanostructured Solar Cells

'''Bau''': 307

'''Raum''': 224

'''Telefon''': 0721-608-22747

'''e-mail''': mailto:stephan.dottermusch@kit.edu

== Tätigkeitsbeschreibung ==
Doktorand im Bereich Nanophotonics for Energy. 3D Strukturierung des aktiven Bereichs einer Solarzelle.

== Fertigkeiten/Kenntnisse ==

=== Geräte ===

*[[Nanoscribe PhotonicProfessional]]
*[[Rasterelektronenmikroskop SUPRA 60 VP]]

=== Prozesse ===

=== Software ===

*Microsoft Office
*Matlab
*[[Lumerical]]

=== Materialien ===

*IP-Dip

== [[Abkürzungen - Abbreviations|PVA]] für IMT-Projekte ==
* [[14-189]]

Liste der Fertigungsmittel - List of Manufacturing Equipment

2015-01-26T15:09:23Z

Stephan.Dottermusch:

Geräte, die nicht auf dieser Liste zu finden sind, stehen auf der [[Prüfmittel Liste - List of Measurement Devices|Liste der Prüfmittel]].
{| class="wikitable sortable" cellpadding= 2 cellspacing= 3 border= 1 style= width:100%;
|- style= background:#fedcba;
! [[Abkürzungen/Abbreviations|Typ]]
! lfd. Nr.
! Prüfmittelname
! Anlagen-/Inv.-Nr.
! Standort
! Geräteverantw./Stellvertreter
|-
|[[Abkürzungen/Abbreviations|RS]]
|0200
| [[Spincoater (OPTIcoat ST22+)|Spincoater (OPTIcoat ST22+)]]
| ---
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Marie-Kristin.Nees|Marie-Kristin Nees]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0201
| [[Oxidationsanlage|Oxidationsanlage]]
| ---
|B 301
R 142
| [[Benutzer:Uwe.Köhler|Uwe Köhler]], [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0202
| [[Oxidationsanlage|Oxidationsanlage]]
| ---
|B 301
R 142
| [[Benutzer:Uwe.Köhler|Uwe Köhler]], [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0203
| [[Kupfergalvanikbad|Kupfergalvanikbad]]
| ---
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SA]]
|0204
| [[Magnetron Sputteranlage Z 700 P 1|Magnetron Sputteranlage Z 700 P 1]]
| 99009890 / 00936432
|B 301
R 302
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|BD]]
|0205
| [[Bedampfungsanlage Univex 450|Bedampfungsanlage Univex 450 mit Depositions Monitor XTM/2]]
| 40000779 / 00967986
|B 301
R 302
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0211
| [[Umluftofen UT 6050 LAF|Umluftofen UT 6050 LAF, Fa. Kendro]]
| 60072765
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0214
| [[HMDS-Ofen Star-2000|HMDS-Ofen Star-2000, Fa. IMTEC]]
| 60000915 / 00954365
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0216
| [[Stromgeber|Stromgeber]]
| 790019
(Campus Süd)
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0220
| [[Goldgalvanikbad|Goldgalvanikbad]]
| ---
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0221
| [[Planarätzer P300|Planarätzer P300]]
| 40000361 / 00963053
|B 309
R 148
| [[Benutzer:Uwe.Köhler|Uwe Köhler]], [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0222
| [[Plasmaätzer 300E|Plasmaätzer 300E, Technics Plasma GmbH]]
| 99011611 / 00943806
|B 301
R 302
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0223
| [[Spin Processor (Entwickler)|Spin Processor (Entwickler)]]
| 60063837
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0224
| [[Belichtungsgerät LH5|Belichtungsgerät LH5]]
| 99013508 / 00952758
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0226
| [[RIE Plasmalab 80 Plus|RIE-Anlage, Plasmalab 80 Plus, Fa. Oxford]]
| 40001196
|B 301
R 142
| [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0227
| [[Stromgeber|Stromgeber]]
| 00972538
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0227
| [[Stromgeber|Stromgeber]]
| 00972539
|B 301
R 207
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0229
| [[Läppmaschine Myläpp|Läppmaschine Myläpp, Fa. Stähli / Schweiz]]
| 00943785
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0230
| [[Läppmaschine Myläpp|Läppmaschine Myläpp, Fa. Stähli / Schweiz]]
| 00936523
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0231
| [[ULTRA-Fräse Polycut E|ULTRA-Fräse Polycut E, Fa. Reichert-Jung]]
| 40000498 / 00965371
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0232
| [[ULTRA-Fräse Polycut E SP 2600|ULTRA-Fräse Polycut E SP 2600, Fa. Reichert-Jung]]
| 60006517 / 00962029
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0233
| [[Ultraschallreinigungsgerät Sonorex Super RK 514 BH|Ultraschallreinigungsgerät: Sonorex Super RK 514 BH, Fa. Bandelin]]
| 00947136
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0234
| [[Ultraschallreinigungsgerät Sonorex 510 H|Ultraschallreinigungsgerät: Sonorex 510 H, Fa. Bandelin]]
| ---
|B 301
R 302
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0235
| [[Vakuumofen Vacutherm|Vakuumofen Vacutherm, Fa. Heraeus]]
| 00978348
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0236
| [[Vakuumofen Vacutherm|Vakuumofen Vacutherm, Fa. Heraeus]]
| 00978349
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0237
| [[Umluftofen UT 5050 EK-LAF|Umluftofen UT 5050 EK-LAF, Fa. Heraeus]]
| 60049765
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0238
| [[Laserbeschriftungsgerät|Laserbeschriftungsgerät]]
| 60063532
|B 309
R 137
| [[Benutzer:Timo.Heneka|Timo Heneka]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0239
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| ---
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0240
| [[Galvanikbad HEGA I |Galvanikbad HEGA I]]
| 60000952
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0241
| [[Galvanikbad HEGA III|Galvanikbad HEGA III]]
| 60000950
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0242
| [[Galvanikbad HEGA IV |Galvanikbad HEGA IV]]
| 40001561
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0244
| [[Vakuumofen Vacutherm|Vakuumofen Vacutherm]]
| 00978352
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0246
| [[Mitsubishi Drahterodiermaschine DWC 90 SZ AE|Mitsubishi Drahterodiermaschine DWC 90 SZ AE]]
| 40001179
|B 301
R 102
| [[Benutzer:Herbert.Kleiber|Herbert Kleiber]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0247
| [[Poliermaschine Safir 355|Poliermaschine Safir 355]]
| 60061279
|B 310
R 152
| [[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|PR]]
|0248
| [[Weberpresse PW 10|Weberpresse PW 10]]
| 00976076
|B 310
R 154
| [[Benutzer:Marc.Schneider|Marc Schneider]], [[Benutzer:Matthias.Worgull|Matthias Worgull]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0249
| [[Elektronenstrahlschreiber VB6 UHR-EWF|Elektronenstrahlschreiber VB6 UHR-EWF]]
| 40002719
|B 301
R 107.8/9
| [[Benutzer:Peter.Jakobs|Peter Jakobs]] [[Benutzer:Andreas.Bacher|Andreas Bacher]]
|-
|[[Abkürzungen/Abbreviations|PR]]
|0250
| [[Abformanlage (WUM2+WUM3)|Abformanlage (WUM2+WUM3)]]
| 40001382
|B 307
R 133**
| [[Benutzer:Marc.Schneider|Marc Schneider]], [[Benutzer:Matthias.Worgull|Matthias Worgull]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0252
| [[Nassprozessanlage|Nassprozessanlage]]
| 40002206
|B 307
R 132c
| [[Benutzer:Julia.Wolf|Julia Wolf]], [[Benutzer:Martin.Börner|Martin Börner]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0253
| [[Ultraschallreinigungsgerät Sonorex|Ultraschallreinigungsgerät: Sonorex]]
| 60041918
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0255
| [[Laseranlage LAY 75K|Laseranlage LAY 75K]]
| 00969460
|B 301
R 210
| [[Benutzer:Giuseppe.Papagno|Giuseppe Papagno]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0256
| [[Heißsiegelbonder Phasemaster IV|Heißsiegelbonder Phasemaster IV]]
| 60049513
|B 301
R 107.3
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]] [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|SO]]
|0257
| [[Positioniereinheit zur partiellen Resistmetallisierung|Positioniereinheit zur partiellen Resistmetallisierung]]
| ---
|B 307
R 132a
| [[Benutzer:Markus.Wissmann|Markus Wissmann]] [[Benutzer:Markus.Guttmann|Markus Guttmann]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0258
| [[Verklebeapparatur|Verklebeapparatur]]
| 60058280
|B 301
R 107.3
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]], [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0259
| [[Trockenofen ED-115|Trockenofen ED-115]]
| 60059063
|B 301
R 107.3
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]], [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0260
| [[Goldgalvanikbad|Goldgalvanikbad]]
| ---
|B 301,
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0261
| [[Klimaschrank Hygros 15 C|Klimaschrank Hygros 15 C]]
| 920003
(Campus Süd)
|B 301
| [[Benutzer:Timo.Heneka|Timo Heneka]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0262
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| 00941116
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0263
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| 00945879
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0264
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| 00935592
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0265
| [[Niederspannungsgerät NLN 35M - 20|Niederspannungsgerät NLN 35M - 20, Fa. Fug]]
| 99068199
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0266
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| ---
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0267
| [[Niederspannungsgerät NLN 35M - 12,5|Niederspannungsgerät NLN 35M - 12,5 Fa. Fug]]
| 00934977
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0268
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 60055210
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0269
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00972477
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0270
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00976418
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0271
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00970906
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0272
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00970908
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0273
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00972476
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0274
| [[Präzisionsstromgeber DIGISTANT 6425T|Präzisionsstromgeber DIGISTANT 6425T, Fa. Burster]]
| 00908322
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0275
| [[Resistklebeplatz|Resistklebeplatz]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0276
| [[Resistklebeplatz|Resistklebeplatz]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0277
| [[Resistklebeplatz|Resistklebeplatz]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0278
| [[Resistklebeplatz|Resistklebeplatz]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0279
| [[Hartnickelbad HEGA II|Hartnickelbad HEGA II]]
| 60000951/
00954353
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0280
| [[Niederspannungsgerät NLN 35M - 12,5|Niederspannungsgerät NLN 35M - 12,5 Fa. Fug]]
| ---
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0281
| [[Niederspannungsgerät NLN 35M - 12,5|Niederspannungsgerät NLN 35M - 12,5 Fa. Fug]]
| 00951115
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0282
| [[Niederspannungsgerät NLN 35M - 12,5|Niederspannungsgerät NLN 35M - 12,5 Fa. Fug]]
| 60055347
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0283
| [[Niederspannungsgerät NLN 35M - 12,5|Niederspannungsgerät NLN 35M - 12,5 Fa. Fug]]
| 60055346
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0284
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00978419
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0285
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 00970907
|B 301
R 206
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0286
| [[Jenoptic-Scanner, Fa. Jenoptik (Litho 3)|Jenoptic-Scanner, Fa. Jenoptik (Litho 3)]]
| ---
|B 348
(Anka)
| [[Benutzer:Daniel.Münch|Daniel Münch]], [[Benutzer:Franz.Pantenburg|Franz-Josef Pantenburg]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0287
| [[Jenoptic-Scanner, Fa. Jenoptik (Litho 1)|Jenoptic-Scanner, Fa. Jenoptik (Litho 1)]]
| ---
|B 348
(Anka)
| [[Benutzer:Daniel.Münch|Daniel Münch]],[[Benutzer:Franz.Pantenburg|Franz-Josef Pantenburg]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0293
| [[Jenoptic-Scanner, Fa. Jenoptik (Litho 2)|Jenoptic-Scanner, Fa. Jenoptik (Litho 2)]]
| ---
|B 348
(Anka)
| [[Benutzer:Daniel.Münch|Daniel Münch]]
[[Benutzer:Franz.Pantenburg|Franz-Josef Pantenburg]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0294
| [[Niederspannungsgerät NTN|Niederspannungsgerät NTN, Fa. Fug]]
| ---
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0295
| [[Resistklebeplatz|Resistklebeplatz]]
| 60052959
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0296
| [[Resistklebeplatz|Resistklebeplatz]]
| 60053088
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0297
| [[Resistklebeplatz|Resistklebeplatz]]
| 60052880
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0298
| [[Trockenschrank WTB Binder ED-53|Trockenschrank WTB Binder ED-53]]
| 60059062
|B 301
R 107.4
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0299
| [[RC8 THP Wafer Processing System|RC8 THP Wafer Processing System, Fa. Süss]]
| ---
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0300
| [[Universal Hochpräzisionsfräsmaschine ACIERA Typ F35 CNC 3500|Universal Hochpräzisionsfräsmaschine ACIERA Typ F35 CNC 3500]]
| 00948130
|B 307
R 121
| [[Benutzer:Alexandra.Moritz|Alexandra Moritz]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0301
| [[Präzisionsstromgeber DIGISTANT 6426|Präzisionsstromgeber DIGISTANT 6426, Fa. Burster]]
| 60055209
|B 301
R 109
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0302
| [[Vakuum-/Inertgasofen 500°C, VT 6060 P-500|Vakuum-/Inertgasofen 500°C, VT 6060 P-500]]
| 60071620
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0306
| [[Umluftofen UT 5050 LAF|Umluftofen UT 5050 LAF, Fa. Kendro]]
| 60072766
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0307
| [[Vakuumofen VT 6060 M|Vakuumofen VT 6060 M, Fa. Kendro]]
| 60072764
|B 307
R 141
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0308
| [[Mikrogalvanikanlage|Mikrogalvanikanlage]]
| ---
|B 307
R 133**
| ?
|-
|[[Abkürzungen/Abbreviations|SL]]
|0309
| [[Megaschallgeber|Megaschallgeber]]
| 60058013
|B 309
R 148
| [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0311
| [[4-TEC Plasmaätzer|4-TEC Plasmaätzer]]
| ---
|B 301
R 142
| [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|HD]]
|0312
| [[Maskenreiniger HMR 900|Maskenreiniger HMR 900]]
| ---
|B 301
R 142
| [[Benutzer:Marie-Kristin.Nees|Marie-Kristin Nees]], [[Benutzer:Heike.Fornasier|Heike Fornasier]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0313
| [[Ultraschallreinigungsanlage für FE|Ultraschallreinigungsanlage für FE]]
| 60087179 /
60082637
|B 310
R 151
| [[Benutzer:Markus.Guttmann|Markus Guttmann]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0314
| [[EVG 620 Double Side Mask Aligner|EVG 620 Double Side Mask Aligner]]
| ---
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Tobias.Wienhold|Tobias Wienhold]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0315
| [[Glanzgoldbad Helodor 100|Glanzgoldbad Helodor 100]]
| ---
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0316
| [[Glanzgoldbad Helodor 101|Glanzgoldbad Helodor 101]]
| ---
|B 301
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0317
| [[Niederspannungsgerät NTN 350M - 20, Fa. Fug|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
|
|B 301
R 140
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|BD]]
|0318
| [[IBAD-Beschichtungsanlage|IBAD-Beschichtungsanlage]]
| 40002710
|B 321
R 308
| [[Benutzer:Martin.Sommer|Martin Sommer]]
[[Benutzer:Martin.Augustin|Martin Augustin]]
|-
|[[Abkürzungen/Abbreviations|SG]]
|0319
| [[Niederspannungsgerät NTN 350M - 20|Niederspannungsgerät NTN 350M - 20, Fa. Fug]]
| ---
|B 301
R 140
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0320
| [[Ball Wedge Bonder 7700 A|Ball Wedge Bonder 7700 A]]
| 60027240 / 00971776
|B 301,
R 153
| [[Benutzer:Martin.Sommer|Martin Sommer]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0321
| [[Rohrofen klappbar|Rohrofen klappbar]]
| 00933660
|B 321
R 202
| [[Benutzer:Martin.Augustin|Martin Augustin]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0322
| [[Rohrofen klappbar|Rohrofen klappbar]]
| 00935484
|B 321
R 202
| [[Benutzer:Martin.Augustin|Martin Augustin]]
|-
|[[Abkürzungen/Abbreviations|SL]]
|0323
| [[Ultraschallreinigungsanlage Powersonic|Ultraschallreinigungsanlage Powersonic]]
| 60065725
|B 321
R 314
| [[Benutzer:Martin.Augustin|Martin Augustin]]
|-
|[[Abkürzungen/Abbreviations|SO]]
|0324
| [[Null-Luft-Generator TG 12 UP|Null-Luft-Generator TG 12 UP]]
| 60096195
|B 321
R 315
| [[Benutzer:Martin.Sommer|Martin Sommer]], [[Benutzer:Martin.Augustin|Martin Augustin]]
|-
|[[Abkürzungen/Abbreviations|TS]]
|0326
| [[Sägemaschine DAD 3430|Sägemaschine DAD 3430]]
| 40009350
|B 301
R 210
| [[Benutzer:Giuseppe.Papagno|Giuseppe Papagno]]
|-
|[[Abkürzungen/Abbreviations|SA]]
|0327
| [[Parylen-Anlage PDS 2010|Parylen-Anlage PDS 2010]]
| 60061262
|B 321
R 108
| Rapp
[[Benutzer:Marian.Dirschka|Marian Dirschka]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0328
| [[Galvanik-Prozesseinheit|Galvanik-Prozesseinheit (Silicet)]]
| 60103764
|B 301
R 109
| [[Benutzer:Markus.Guttmann|Markus Guttmann]], [[Benutzer:Andreas.Bacher|Andreas Bacher]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0329
| [[Trockenofen Heratherm OMH 60|Trockenofen Heratherm OMH 60]]
| 60105688
|B 321
R 112
| [[Benutzer:Kai.Sachsenheimer|Kai Sachsenheimer]], [[Benutzer:Marian.Dirschka|Marian Dirschka]]
|-
|[[Abkürzungen/Abbreviations|SO]]
|0330
| [[Marvin-Anlage|Marvin-Anlage]]
| ---
|B 321
R 108
| Rapp
[[Benutzer:Marian.Dirschka|Marian Dirschka]]
|-
|[[Abkürzungen/Abbreviations|SO]]
|0331
| [[Wasservollentsalzer Seradest S1500|Wasservollentsalzer Seradest S1500]]
| 99069492
|B 321
R 314
| [[Benutzer:Martin.Sommer|Martin Sommer]]
|-
|[[Abkürzungen/Abbreviations|SA]]
|0332
| [[Spincoater|Spincoater]]
| 60096386
|B 421
R 112
| [[Benutzer:Marian.Dirschka|Marian Dirschka]], [[Benutzer:Christiane.Neumann|Christiane Neumann]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0333
| [[Ultraschallschweißgerät|Ultraschallschweißgerät]]
| ---
|B 301,
R 107.3
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|GA]]
|0334
| [[Goldgalvanikbad|Goldgalvanikbad (FMK, WA wie GA 0220)]]
| ---
|B 301,
R 141
| [[Benutzer:Barbara.Matthis|Barbara Matthis]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0335
| [[Hotplate (OPTIhot SHT20)|Hotplate (OPTIhot SHT20)]]
| ---
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Marie-Kristin.Nees|Marie-Kristin Nees]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0336
| [[Hotplatebox (Horst)|Hotplatebox (Horst)]]
| ---
|B 301
R 143
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Marie-Kristin.Nees|Marie-Kristin Nees]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0337
| [[Lackentferner STP 2020|Lackentferner STP 2020]]
| 40002934
|B 301
R 148
| [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0338
| [[Spincoater Primus STT15|Spincoater Primus STT15]]
| 10001957 (Campus Süd)
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|SE]]
|0339
| [[Sprühentwickler ST30 (organisch)|Sprühentwickler ST30 (organisch)]]
| ---
|B 309
R 148
| [[Benutzer:Marie-Kristin.Nees|Marie-Kristin Nees]], [[Benutzer:Andreas.Bacher|Andreas Bacher]]
|-
|[[Abkürzungen/Abbreviations|SE]]
|0340
| [[Sprühentwickler ST30 (anorganisch)|Sprühentwickler ST30 (anorganisch)]]
| ---
|B 301
R 142
| [[Benutzer:Heike.Fornasier|Heike Fornasier]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|RS]]
|0341
| [[Spincoater Primus STT15|Spincoater Primus STT15]]
|
|B 307
R 132d
| [[Benutzer:Julia.Wolf|Julia Wolf]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|XX]]
|0342
| [[|]]
|
|B
R
|
|-
|[[Abkürzungen/Abbreviations|PR]]
|0801
| [[Abformanlage WUM 1|Abformanlage WUM 1]]
| 40001279
|B 310
R 154
| [[Benutzer:Marc.Schneider|Marc Schneider]], [[Benutzer:Matthias.Worgull|Matthias Worgull]]
|-
|[[Abkürzungen/Abbreviations|PR]]
|0802
| [[Nanoimprintanlage EVG 510HE|Nanoimprintanlage EVG 510HE]]
| 40003179
|B 307
R 132c
| [[Benutzer:Marc.Schneider|Marc Schneider]], [[Benutzer:Matthias.Worgull|Matthias Worgull]]
|-
|[[Abkürzungen/Abbreviations|XX]]
|0803
| [[|]]
|
|B
R
|
|-
|[[Abkürzungen/Abbreviations|OF]]
|0804
| [[Trockenofen Memmert 500|Trockenofen Memmert 500]]
| 60047154
|B 301
R 211
| [[Benutzer:Ida.Humbert|Ida Humbert]], [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0805
| [[Trockenofen Memmert 100|Trockenofen Memmert 100]]
| ---
|B 301
R 211
| [[Benutzer:Ida.Humbert|Ida Humbert]], [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0808
| [[Verklebeapparatur|Verklebeapparatur]]
| 60044056
|B 301
R 211
| [[Benutzer:Ralf.Ahrens|Ralf Ahrens]], [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|PR]]
|0809
| [[Abformanlage WMP 1000|Abformanlage WMP 1000]]
| 40002611
|B 301
R 107.7
| [[Benutzer:Marc.Schneider|Marc Schneider]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0810
| [[CNC Fräsmaschine|CNC Fräsmaschine]]
| ---
|B
R
|
|-
|[[Abkürzungen/Abbreviations|SL]]
|0811
| [[Ultraschallbad|Ultraschallbad]]
| ---
|B 301
R 211
| [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0812
| [[Hotplate HP-155|Hotplate HP-155]]
| ---
|B 301
R 211
| [[Benutzer:Ida.Humbert|Ida Humbert]]
|-
|[[Abkürzungen/Abbreviations|BE]]
|0814
| [[Schleif- und Poliermaschine Saphir 350E|Schleif- und Poliermaschine Saphir 350E]]
| 60082686
|B 310
R 155
| Simon
[[Benutzer:Marco.Heiler|Marco Heiler]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0816
| [[UV-Härtelampe DeloLux 04|UV-Härtelampe DeloLux 04]]
| 60055155
|B 301
R 211
| [[Benutzer:Ida.Humbert|Ida Humbert]], [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0817
| [[Dosierautomat|Dosierautomat]]
| 60072221
|B 307
R 132c
| [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|SA]]
|0818
| [[Sputteranlage UNIVEX 500|Sputteranlage UNIVEX 500]]
| 40001770
|B 309
R 137
| [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0819
| [[Vakuum-Trockenschrank|Vakuum-Trockenschrank]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|OF]]
|0820
| [[Umluftofen|Umluftofen]]
| ---
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]], [[Benutzer:Uwe.Köhler|Uwe Köhler]]
|-
|[[Abkürzungen/Abbreviations|PR]]
|0821
| [[Abformanlage HEX 03 |Abformanlage HEX 03 ]]
| 40001942
|B 310
R 154
| [[Benutzer:Marc.Schneider|Marc Schneider]], [[Benutzer:Matthias.Worgull|Matthias Worgull]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0822
| [[UV-Härtelampe DeloLux 04|UV-Härtelampe DeloLux 04]]
| 60059394
|B 301
R 107.3
| [[Benutzer:Ida.Humbert|Ida Humbert]] [[Benutzer:Ralf.Ahrens|Ralf Ahrens]]
|-
|[[Abkürzungen/Abbreviations|XX]]
|0823
| [[|]]
| ---
|B
R
|
|-
|[[Abkürzungen/Abbreviations|XX]]
|0824
| [[|]]
| ---
|B
R
|
|-
|[[Abkürzungen/Abbreviations|OF]]
|0825
| [[Vakuumofen VT 5050 EK|Vakuumofen VT 5050 EK]]
| 00929745
|B 310
R 151
| [[Benutzer:Markus.Wissmann|Markus Wissmann]]
|-
|[[Abkürzungen/Abbreviations|MP]]
|0826
| [[Montageplatz 1 „Fasermontage und Deckelung“|Montageplatz 1 „Fasermontage und Deckelung“]]
| ---
|B 307
R 027a
| [[Benutzer:Arndt.Last|Arndt Last]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0827
| [[UV-Härtelampe SUV-DC Lumatec|UV-Härtelampe SUV-DC Lumatec]]
| ---
|B 307
R 027a
| [[Benutzer:Arndt.Last|Arndt Last]]
|-
|[[Abkürzungen/Abbreviations|VS]]
|0829
| [[Kleberoboter|Kleberoboter]]
| 60090555
|B 307
R 132c
| [[Benutzer:Birgit.Hübner|Birgit Hübner]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0830
| [[RIE/RIBE_Oxford_PlasmaLab_100|OPT - Trockenätzanlage (RIE/ICP, RIBE)]]
| 80000990
|B 307
R 132 a+b
| [[Benutzer:Daniel.Häringer|Daniel Häringer]], [[Benutzer:Alban.Muslija|Alban Muslija]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0831
| [[Laser-Lithographie-Anlage|Laser-Lithographie-Anlage]]
| 40003100
|B 307
R 141
| [[Benutzer:Joachim.Schulz|Joachim Schulz]] [[Benutzer:Stefan.Hengsbach|Stefan Hengsbach]]
|-
|[[Abkürzungen/Abbreviations|BS]]
|0832
| [[Nanoscribe PhotonicProfessional]]
|
|B 307
R 123c
| [[Benutzer:Uwe.Köhler|Uwe Köhler]] [[Benutzer:Stefan.Hengsbach|Stefan Hengsbach]]
|-
|[[Abkürzungen/Abbreviations|AE]]
|0833
| [[Plasma-Anlage Diener Electronics|Plasma-Anlage Diener Electronics]]
|
|B 307
R 107.4
| [[Benutzer:Hendrik.Hölscher|Hendrik Hölscher]], [[Benutzer:Tobias.Meier|Tobias Meier]]
|-
|}

[[Kategorie:Listen - Lists]]
[[Kategorie:Geräte - Devices]]
[[Kategorie:Fertigungsmittel - Manufacturing Equipment]]

Reinraum - Cleanroom

2015-01-26T15:08:38Z

Stephan.Dottermusch:

[[{{PAGENAME}}/english|English version]]

'''Die Reinräume des IMT'''

Das IMT verfügt über ca. 500 m² Reinraumfläche der Klasse ISO 7 (nach DIN EN ISO 14644). Diese Räume sind dem Funktionsbereich [[Mikrofertigung (MF)]] zugeordnet. Unter anderem befindet sich hier die E-Beam-Lithografie, UV-Lithografie in verschiedenen Varianten, wie z.B. Direct Laser Writing, ein [[EVG_620_Double_Side_Mask_Aligner| Mask Aligner von EVG]] und zwei [[Nanoscribe PhotonicProfessional|NANOSCRIBE]] Geräte und die dazugehörige Infrastruktur wie Spin Coater, Entwickler und diverse Plasmaätzanlagen.

Der IMT-Reinraum kann nur mit Genehmigung von MF selbstständig genutzt werden. Im Reinraum gilt die Arbeitsanweisung AA505.xx [[Reinraumregeln|(s.a. Reinraumregeln)]]. Mitarbeiter mit einer allgemeinen Sicherheitsunterweisung dürfen den Reinraum in Begleitung eines Mitarbeiters mit Zutrittsberechtigung betreten und unter Aufsicht oder zusammen mit einem berechtigten Mitarbeiter Anlagen im Reinraum nutzen oder andere Tätigkeiten wie REM-Inspektionen oder sonstige Messungen ausführen. Wer umfangreiche Arbeiten selbstständig im Reinraum vornehmen will, muss dies mit einem Formular FB516.xx beim Gruppenleiter der Fertigungsausführung [[Benutzer:Uwe.Koehler|Uwe Köhler]] beantragen. Dieser Antrag muss eine Begründung für den selbstständigen Reinraumzutritt, die Projektnummer der geplanten Arbeiten und eine Abschätzung der wöchentlichen Arbeitszeit beinhalten und vom FBL des Antragstellers gegengezeichnet sein. Wer nur bis zu 3 Monaten am IMT tätig ist, bekommt in der Regel keinen selbstständigen Zugang, alle anderen benötigen eine mindestens 4-wöchige Einarbeitungszeit.

[[Kategorie: Infrastruktur]]