User:Abrar.Faisal: Difference between revisions

Latest revision as of 17:21, 24 October 2025

Department: FuE3-XOM

Research Field: X-ray Gratings

Building: 307

Room: 223

Telephone: 22767

E-mail: mailto:abrar.faisal@kit.edu

Development and optimization of X-ray gratings fabrication process for achieving small periods <2µm:

mr-X resist

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 == Job Description ==
+Development and optimization of X-ray gratings fabrication process for achieving small periods <2µm:
+* Analyse dose deposition during X-ray exposure
+* Study resist behaviour,mainly mechanical stiffness
+* Resist modifications as required
+* Optimize development and drying conditions to avoid defects
+* Design new grating layouts for mechanical stabilization of structures
+* Testing of grating performance in real applications
 == Expertise ==
 === Devices ===
+* LABCONCO FD machine
+* Sentech
+* SEM
+* Optical microscope
+* Spin-coater
+* Hot-plates
+* Vacuum oven
+* Laser imprinting on Si
 === Processes ===
+* RIE
+* Spin-coating
+* Soft-bake
+* LIGA exposure
+* PEB
+* Development
+* Freeze drying
+* Resist stripping
 === Software ===
+* Origin
+* DoseSim
+* analySIS
+* Inkscape
+* Mendeley
 === Materials ===
+mr-X resist
 == [[Abkürzungen - Abbreviations|PVA]] for IMT Projects ==
-* [[00-000P]]
+* [[15-225]] Sub-µm LiGa
-== Further Tasks at IMT ==
+<!-- == Further Tasks at IMT == -->
 <!-- e.g. device responsible , board member, etc. -->
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+[[Category:Ehemalige_Mitarbeiter_-_Former_Employees]]
+[[Category:Ehemalige_Doktoranden_-_Former_PhD_Students]]