Sputteranlage UNIVEX 500/English

250px|thumb|right|< machine for sputtering>

Device name: machine for sputtering - UNIVEX 500

Operator/Responsible for this device: Birgit Hübner

Position: building 309, room 137

Device designation: SA 0818

Specifiaction number:

Short Description

The Leybold UNIVEX Z500 is able to sputter carbon coatings on silicon oxide wafers for x-ray masks.

Device Specifications

The process gas is argon.

Nitrogen is used to ventilate the vacuum chamber.

Established Processes

• 4" - silicon substrate (with 1% silicon oxide) can be coated with approximately 50 nm carbon (C).

• Glass slides also can be coated with approximately 100nm carbon (C).

Instructed Users

• Hübner, Birgit

• Köhler, Uwe