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== Type == |
== Type == |
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'''mr-X''' (formerly: '''mr-L''') is a [[:Kategorie:Negativresist - negative resist|negative tone resist]]. It was developped by micro resist technology, based on [[SU-8]], and is particularly suited for high aspect ratio structures fabricated by deep X-Ray lithography. |
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- Short description, e.g. Photoresist, shape memory alloy/polymer, Solvent, ... |
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- distinctive feature |
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=== Availability === |
=== Availability === |
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* '''mr-X10''': Layers up to ca. 40 µm |
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- e.g. is it in stock as a standard, what variants, concentrations are available? |
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* '''mr-X50''': Layers up to ca. 300 µm |
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=== Machines === |
=== Machines === |
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*for application to substrates: |
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**[[Spincoater]] |
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*for Lithography: |
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**[[Jenoptic-Scanner, Fa. Jenoptik (Litho 1)|Litho 1]] |
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**[[Jenoptic-Scanner, Fa. Jenoptik (Litho 2)|Litho 2]] |
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**[[Jenoptic-Scanner, Fa. Jenoptik (Litho 3)|Litho 3]] |
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*[[:Kategorie:Galvanik - Electroforming|Electroplating baths]] |
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=== Processes === |
=== Processes === |
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* [[LIGA]] |
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** X-Ray gratings |
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** X-Ray lenses |
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=== Contact person === |
=== Contact person === |
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* [[Benutzer:Danays.Kunka|Danays Kunka]] |
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* [[Benutzer:Frieder.Koch|Frieder Koch]] |
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* [[Benutzer:Alexandra.Karbacher|Alexandra Karbacher]] |
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* [[Benutzer:Pascal.Meyer|Pascal Meyer]] |
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* [[Benutzer:Jan.Meiser|Jan Meiser]] |
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* [[Benutzer:Felix.Marschall|Felix Marschall]] |
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* [[Benutzer:Heike.Fornasier|Heike Fornasier]] |
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=== Alternatives === |
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* [[SU-8]] |
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<!-- Weitere Kategorien: FuEX, --> |
<!-- Weitere Kategorien: FuEX, --> |
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Revision as of 15:27, 6 March 2014
Type
mr-X (formerly: mr-L) is a negative tone resist. It was developped by micro resist technology, based on SU-8, and is particularly suited for high aspect ratio structures fabricated by deep X-Ray lithography.
Properties
- e.g. chemical composition, in what form do you buy it at which prize etc.
GHS hazard classification
At IMT
Availability
- mr-X10: Layers up to ca. 40 µm
- mr-X50: Layers up to ca. 300 µm
Machines
- for application to substrates:
- for Lithography:
- Electroplating baths
Processes
- LIGA
- X-Ray gratings
- X-Ray lenses
Contact person
- Danays Kunka
- Frieder Koch
- Alexandra Karbacher
- Pascal Meyer
- Jan Meiser
- Felix Marschall
- Heike Fornasier
