Mr-X/English: Difference between revisions
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=== Contact person === |
=== Contact person === |
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* [[User:Danays.Kunka|Danays Kunka]] |
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* [[ |
* [[User:Frieder.Koch|Frieder Koch]] |
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* [[ |
* [[User:Alexandra.Karbacher|Alexandra Karbacher]] |
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* [[ |
* [[User:Pascal.Meyer|Pascal Meyer]] |
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* [[ |
* [[User:Jan.Meiser|Jan Meiser]] |
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* [[ |
* [[User:Felix.Marschall|Felix Marschall]] |
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* [[ |
* [[User:Heike.Fornasier|Heike Fornasier]] |
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=== Alternatives === |
=== Alternatives === |
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Latest revision as of 20:12, 19 November 2016
Type
mr-X (formerly: mr-L) is a negative tone resist. It was developped by micro resist technology, based on SU-8, and is particularly suited for high aspect ratio structures fabricated by deep X-Ray lithography.
Properties
- e.g. chemical composition, in what form do you buy it at which prize etc.
GHS hazard classification
At IMT
Availability
- mr-X10: Layers up to ca. 40 µm
- mr-X50: Layers up to ca. 300 µm
Machines
- for application to substrates:
- for Lithography:
- Electroplating baths
Processes
- LIGA
- X-Ray gratings
- X-Ray lenses
Contact person
- Danays Kunka
- Frieder Koch
- Alexandra Karbacher
- Pascal Meyer
- Jan Meiser
- Felix Marschall
- Heike Fornasier
