User:Birgit.Huebner/English: Difference between revisions
From IMT-Wiki
Jump to navigationJump to search
(Die Seite wurde neu angelegt: „200px|thumb|rechts|Birgit Hübner == Birgit Hübner == '''Department''': MF - Microfabrikation '''Research Field''': resist laboratory, etch labo…“) |
No edit summary |
||
| (20 intermediate revisions by 2 users not shown) | |||
| Line 1: | Line 1: | ||
[[Datei:.jpg|200px|thumb|rechts|Birgit Hübner]] |
|||
== Birgit Hübner == |
== Birgit Hübner == |
||
[[file:Huebner.jpg|rahmenlos|links|Text der Bild-Legende]] |
|||
'''Department''': |
'''Department''': Core Technologies (CTE) |
||
| ⚫ | |||
'''Bau''': 307 |
|||
| ⚫ | |||
'''Raum''': 223 |
|||
''' |
'''Bau''': 310 |
||
''' |
'''Raum''': 252 |
||
''' |
'''Telephone''': 0721/608-22601 |
||
*[[Benutzer:Pascal.Meyer|Meyer, Pascal]] |
|||
'''e-mail''': mailto:birgit.huebner2@kit.edu |
|||
*[[Benutzer:Danays.Kunka|Kunka, Danays]] |
|||
*[[Benutzer:Maximilian.Amberger|Amberger, Maximilian]] |
|||
'''Substitute''': |
|||
== Job Description == |
== Job Description == |
||
Increasing the area of micro-gratings for X-ray Phase Contrast Imaging. |
|||
I'm an employee in microfabrication and Mrs Julia Wolfs' substitute in the field of developing. |
|||
| ⚫ | |||
* ChemA - Administrator of the clean room area ([[Reinraum - Cleanroom|IMT-clean room]]) |
|||
Anyone who wants to bring chemicals into the clean room has to contact me and to register their chemicals with the associated material safety data sheet. |
|||
== Expertise == |
== Expertise == |
||
I'm a chemical loboratory assistant. |
|||
Due to my part-time job, I'm only in the morning at IMT. |
|||
* glue on resist foils (with the three-axis-table-robot, the thickness of foils can be 100 µm to 3 mm) |
|||
* resist casting on Invar-mask blanks and 4" wafers |
|||
* casting of mould inserts |
|||
* sputtering of carbon layers |
|||
* freeze drying with cyclohexane |
|||
* oxidation |
|||
* wet-chemical developing of irradiated resists (per pro.) |
|||
* wet-chemical etching with KOH and hydrofluoric acid (HF) |
|||
* gluing of fibre glass in V-ditches on Si-wafers |
|||
* organisation of the resist laboratory |
|||
* management of the ChemA for the clean room area |
|||
=== Devices === |
=== Devices === |
||
* [[4TEC-Plasmaätzer]] |
|||
* |
*[[Kleberoboter]] |
||
* |
*[[Sputteranlage UNIVEX 500]] |
||
*[[Oxidationsanlage]] |
|||
* [[Hotplatebox (Horst)]] |
|||
| ⚫ | |||
* [[Hotplate (OPTIhot SHT20)]] |
|||
*[[Oberflächenmessgerät TENCOR P 2]] |
|||
| ⚫ | |||
*[[Nassprozessanlage]] |
|||
* [[RIE-Anlage, Plasmalab 80 Plus]] |
|||
*[[Ultraschallreinigungsgerät: Sonorex]] |
|||
* [[Rasterelektronenmikroskop JSM-6600]] |
|||
*[[Messmikroskop Metalloplan HL]] |
|||
* [[Spincoater Primus STT15]] |
|||
*[[Höhentaster MT 60M]] |
|||
*[[Analysenwaage AT 460]] |
|||
*[[Vakuumofen Vacutherm]] |
|||
*[[Vakuumofen VT 6060 P]] |
|||
*[[Vakuum-Trockenschrank WTB Binder]] |
|||
*[[Umluftofen UT 5050 EK-LAF]] |
|||
*[[Umluftofen UT 5050]] |
|||
*[[Zeit-Drucksteuergerät]] |
|||
=== Processes === |
=== Processes === |
||
* gluing of resists |
|||
*[http://www.x-ray-optics.de/index.php?option=com_content&view=article&id=84%3Aliga-process&catid=29%3Ax-ray-optics&lang=en Direct-LIGA] |
|||
* sputtering of carbon layers |
|||
* freeze drying |
|||
* oxidation |
|||
* wet-chemical etching |
|||
* wet-chemical developing |
|||
=== Software === |
=== Software === |
||
* JR Points (version 4.6 - Software for the robot of gluing) |
|||
* [[DoseSim]] |
|||
* AnalySIS |
|||
* Microsoft Excel |
|||
* MS Office |
|||
=== Materials === |
=== Materials === |
||
| ⚫ | |||
* [[mr-L/mr-X|mr-X]] |
|||
* Durimide |
|||
* [[Silizium/Silicon|Silizium]] |
|||
** [[4"-Wafer 525 µm]] |
|||
** [[4"-Wafer 200 µm]] |
|||
** [[4"-Wafer 100 µm]] |
|||
* [[Titan/Titanium|Titanium]] |
|||
| ⚫ | |||
* [[Thermo-Klebefolien - Thermal Release Tape|Thermal Release Tape]] |
|||
| ⚫ | |||
* Wiki-Administrator |
|||
Latest revision as of 19:36, 19 November 2016
Birgit Hübner
Department: Core Technologies (CTE)
Research Field: resist laboratory, laboratory for etching, ChemA
Bau: 310
Raum: 252
Telephone: 0721/608-22601
e-mail: mailto:birgit.huebner2@kit.edu
Substitute:
Job Description
I'm an employee in microfabrication and Mrs Julia Wolfs' substitute in the field of developing.
Further Tasks at IMT
- ChemA - Administrator of the clean room area (IMT-clean room)
Anyone who wants to bring chemicals into the clean room has to contact me and to register their chemicals with the associated material safety data sheet.
Expertise
I'm a chemical loboratory assistant.
Due to my part-time job, I'm only in the morning at IMT.
- glue on resist foils (with the three-axis-table-robot, the thickness of foils can be 100 µm to 3 mm)
- resist casting on Invar-mask blanks and 4" wafers
- casting of mould inserts
- sputtering of carbon layers
- freeze drying with cyclohexane
- oxidation
- wet-chemical developing of irradiated resists (per pro.)
- wet-chemical etching with KOH and hydrofluoric acid (HF)
- gluing of fibre glass in V-ditches on Si-wafers
- organisation of the resist laboratory
- management of the ChemA for the clean room area
Devices
- Kleberoboter
- Sputteranlage UNIVEX 500
- Oxidationsanlage
- Laserbeschriftungsgerät
- Oberflächenmessgerät TENCOR P 2
- Nassprozessanlage
- Ultraschallreinigungsgerät: Sonorex
- Messmikroskop Metalloplan HL
- Höhentaster MT 60M
- Analysenwaage AT 460
- Vakuumofen Vacutherm
- Vakuumofen VT 6060 P
- Vakuum-Trockenschrank WTB Binder
- Umluftofen UT 5050 EK-LAF
- Umluftofen UT 5050
- Zeit-Drucksteuergerät
Processes
- gluing of resists
- sputtering of carbon layers
- freeze drying
- oxidation
- wet-chemical etching
- wet-chemical developing
Software
- JR Points (version 4.6 - Software for the robot of gluing)
- AnalySIS
- MS Office
Materials
- PMMA-foils
- Durimide
