User:Birgit.Huebner/English: Difference between revisions
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== Job Description == |
== Job Description == |
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I'm employee |
I'm an employee in microfabrication and Mrs Julia Wolfs' substitute in the field of developing. |
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== Further Tasks at IMT == |
== Further Tasks at IMT == |
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* ChemA - Administrator of the clean room area ([[Reinraum - Cleanroom|IMT-clean room]]) |
* ChemA - Administrator of the clean room area ([[Reinraum - Cleanroom|IMT-clean room]]) |
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Anyone who wants to bring chemicals into the clean room has to contact me and to register their chemicals with the associated material safety data sheet. |
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== Expertise == |
== Expertise == |
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* glue on resist foils (with the three-axis-table-robot, the thickness of foils can be 100 µm to 3 mm) |
* glue on resist foils (with the three-axis-table-robot, the thickness of foils can be 100 µm to 3 mm) |
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* resist casting on Invar-mask |
* resist casting on Invar-mask blanks and 4" wafers |
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* casting of mould inserts |
* casting of mould inserts |
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* sputtering of carbon layers |
* sputtering of carbon layers |
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Revision as of 13:29, 5 February 2016
Birgit Hübner
rahmenlos|links|Text der Bild-Legende
Department: Core Technologies (CTE)
Research Field: resist laboratory, laboratory for etching, ChemA
Bau: 310
Raum: 252
Telephone: 0721/608-22601
e-mail: mailto:birgit.huebner2@kit.edu
Substitute: Wolf, Julia
Job Description
I'm an employee in microfabrication and Mrs Julia Wolfs' substitute in the field of developing.
Further Tasks at IMT
- ChemA - Administrator of the clean room area (IMT-clean room)
Anyone who wants to bring chemicals into the clean room has to contact me and to register their chemicals with the associated material safety data sheet.
Expertise
I'm a chemical loboratory assistant.
Due to my part-time job, I'm only in the morning at IMT.
- glue on resist foils (with the three-axis-table-robot, the thickness of foils can be 100 µm to 3 mm)
- resist casting on Invar-mask blanks and 4" wafers
- casting of mould inserts
- sputtering of carbon layers
- freeze drying with cyclohexane
- oxidation
- wet-chemical developing of irradiated resists (per pro.)
- wet-chemical etching with KOH and hydrofluoric acid (HF)
- gluing of fibre glass in V-ditches on Si-wafers
- organisation of the resist laboratory
- management of the ChemA for the clean room area
Devices
- Kleberoboter
- Sputteranlage UNIVEX 500
- Oxidationsanlage
- Laserbeschriftungsgerät
- Oberflächenmessgerät TENCOR P 2
- Nassprozessanlage
- Ultraschallreinigungsgerät: Sonorex
- Messmikroskop Metalloplan HL
- Höhentaster MT 60M
- Analysenwaage AT 460
- Vakuumofen Vacutherm
- Vakuumofen VT 6060 P
- Vakuum-Trockenschrank WTB Binder
- Umluftofen UT 5050 EK-LAF
- Umluftofen UT 5050
- Zeit-Drucksteuergerät
Processes
- gluing of resists
- sputtering of carbon layers
- freeze drying
- oxidation
- wet-chemical etching
- wet-chemical developing
Software
- JR Points (version 4.6 - Software for the robot of gluing)
- AnalySIS
- MS Office
Materials
- PMMA-foils
- Durimide
