Reinraum - Cleanroom/english
Cleanrooms at IMT
The IMT possesses ca. 600 m² of class ISO 7 (DIN EN ISO 14644) clean rooms. These rooms are under the supervision of the Core Technologies (CTE) Department, represented by the group leader microtechnologies, Uwe Köhler. Devices in the clean rooms include the Electron Beam lithography and UV lithography facilities such as Direct Laser Writing, an EVG mask aligner and two NANOSCRIBE devices, as well as the surrounding infrastructure like Spin-Coater, Developer and Plasma Etching facilities.
For any work in the clean room, the rules of working instruction AA505.xx apply (see here also). Employees with a general safety instruction may enter the clean room accompanied by or under the supervision of an employee with entrance permit and use the facilities therein or do other things like SEM inspections or easy measurement tasks.
Access
Anyone planning extensive independent work in the clean room has to request permission from CTE. Therefor anyone first has to contact Uwe Köhler. Candidates for personal access will have a kick-off meeting with the clean room team, where they describe their future work and stake out their claims concerning infrastructure and clean room team. In form FB527.xx a mentor will be designated who supervises the induction and discusses the necessary device instructions. After the induction time the personal ID-Card is coded for a three months clean room access. With each participation in the quarterly clean room user meeting the access is extended by another three months.
- Access with a personal ID-Card is only granted for intensive and regular work. Once a week is not enough.
- Candidates for personal access will have a kick-off meeting with the clean room team and their mentor or adviser, where an instruction plan will be discussed and decided.
- Cleanroom access is only ever 3 months - for the period between one clean room user meeting to the next
- Checkliste Reinraumzutritt FB527.xx
- Standard access to the clean room is reduced to 7 am to 5 pm Other times must be applied for and need to be well founded.
- Every misbehavior reduces your admission in access or time.
- In case of severe misdoings your access will be totally canceled for a limited time.
But: access is always possible with an adviser, mentor or team member. You can also always instruct someone of the team by Laufkarte.
| Bereich | Mentor(en) |
|---|---|
| FuE1-BSS | Felix Vüllers |
| FuE1-NM | Markus Meissner |
| FuE1-SMD | Alban Muslija |
| FuE2-BBM | Sebastian von der Ecken |
| FuE2-PA | Sebastian Kiss |
| FuE3-TN | Marie-Kristin Gamer, Florian Rupp, Stefan Hengsbach |
| FuE3-XOM | Alexandra Karbacher, Martin Börner |
| FuE4-3GP | Stephan Dottermusch |
| CTE | Uwe Köhler, Paul Abaffy, Heike Fornasier, Birgit Hübner, Barbara Matthis |
Cleanroom Team
- Nanoscribe und DWL: Florian Rupp und Stefan Hengsbach
- OLI und Spincoater: Heike Fornasier
- E-beam: Lothar Hahn, Marie-Kristin Gamer und Andreas Bacher
- REM: Paul Abaffy
- Galvanik: Barbara Matthis
- RIE/RIBE: Alban Muslija
- Resisttechnik und Chemikalien (ChemA): Birgit Hübner
- Technik und Infrastruktur: Timo Heneka und Uwe Köhler
Cleanroom User Group Meeting
- every 6 month (2 times per annum) for better networking, better information flow, less anonymity and co-education
- compulsory for all cleanroom users
- 5 scientific presentation (10+5 min)
- poster session (microscope and SEM picture gallery)
- varia from user community
- remarks on security, equipment, new members, ...
