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    Institute of Microstructure Technology (IMT)

     

    • Startpage
    • Equipment & Facilities
    • Lithography
    • XRL Exposure Stations
    • LIGA 1

     

    • Startseite
      • Welcome to the IMT
      • Research at IMT
      • Staff A-Z
      • Start-ups & Spin-offs
      • Equipment & Facilities
      • Studies / Career
      • IMT internal
    • Equipment & Facilities
      • CORREL
      • HiT-NMR
      • KNMR: Karlsruhe nuclear magnetic resonance facility
      • Cleanroom
      • Electronics Lab
      • Mechanical Workshop
      • Lithography
      • AFM and Surface Characterisation
      • Nuclear Magnetic Resonance
      • Optical Spectroscopy
      • Printing Technologies
      • Dry Etching Cluster
      • Surface Structuring
      • Solar-Driven Water Treatment
    • Lithography
      • XRL Exposure Stations
    • XRL Exposure Stations
      • LIGA 1
      • LIGA 2
      • LIGA 3
    • LIGA 1
    • LIGA 1
    • Contact
    • Layout
    • Characteristics
    • Publications

    LIGA uses deep X-ray lithography with synchrotron radiation for the production of high aspect ratio polymer microstructures. By shadow printing an X-ray mask is copied into an X-ray sensitive resist. A chemical developer dissolves the irradiated areas. Free lateral shape, structures heights from several µm up to several millimetres, vertical sidewalls with optical quality (Ra < 20 nm) and sub µm structure details are the basic characteristics of this process step.

    The whole laboratory is placed inside a clean room for accurate environment conditions. The experimental equipment, together with the microstructure fabrication capabilities at IMT/KIT, is a unique installation for high precision and high aspect ratio microstructure fabrication. Even the resist preparation, development and optional electroforming process is done by using the clean room capabilities and expertise of IMT.

    The microstructure laboratory at KARA consists of three beamlines for deep x-ray lithography, each dedicated to a specific task in the LIGA-process. In this chapter we present the LIGA1 (Litho1) beamline, dedicated to high resolution X-ray mask making and thin film X-ray lithography (XRL). The typical data for the structural height is up to 100 microns with a smallest width of 1 µm. Smaller line widths as well as thinner structures are design dependent and therefore under further development according to the demands of the micro/nano interface.

    Team LIGA 1
    Name Title Phone E-Mail
    Börner, Martin Dr. +49 721 608-24437 martin boerner ∂does-not-exist.kit edu
    1 additional person visible within KIT only.
    LIGA IIMT / KIT
    Energy range
    2.2 - 3.3 keV
    Source
    1.5 T Bending magnet, bending radius: 5.556 m
    Be-window
    175 µm
    Mirror
    Si/200nm Cr @ 15.4 mrad
    Distance: source point-mask plane
    14.84 m
    Distance: source point -mirror
    8,61 m
    Be-window aperture
    20 mm (vertical) x 110 mm (horizontal)
    Usable horizontal fan
    108 mm
    Sample environment
    100 mbar He
    Experimental setup
    JenOptik DexKfK X-ray scanner with tilting option (+/- 60°)
    Alignment / instrumental overlay accuracy
    External / 2µm

    Publications


    last change: 2025-04-17
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